Photo induced surface near crystallization of a glass in the system Na 2O/K2O/CaO/CaF2/Al2O 3/SiO2

Journal of Non-Crystalline Solids

Volumn 356, Issue 52-54, 2010, Pages 3090-3094

  Ritter, Kathrin ^a   Gerlach, Sandra ^a   Rüssel, Christian ^a  

^a FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

Crystallization; Oxyfluoride glass; Photosensitivity

Indexed keywords

GLASS SLIDES; OXY-FLUORIDE GLASS; PHOTO-INDUCED SURFACES; THERMAL-ANNEALING; TWO-STEP PROCESS; UV LIGHT; VOLUME EXPANSION;

ANNEALING; GLASS; LIGHT SENSITIVE MATERIALS; PHOTOSENSITIVITY; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; SODIUM; X RAY DIFFRACTION;

CRYSTALLIZATION;

EID: 78649680784     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2010.04.056     Document Type: Conference Paper

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