Understanding the nature of the kinetic process in a VO2 metal-insulator transition

Physical Review Letters

Volumn 105, Issue 22, 2010, Pages

  Yao, Tao ^a   Zhang, Xiaodong ^b   Sun, Zhihu ^a   Liu, Shoujie ^a   Huang, Yuanyuan ^a   Xie, Yi ^b   Wu, Changzheng ^b   Yuan, Xun ^c   Zhang, Wenqing ^c   Wu, Ziyu ^a   Pan, Guoqiang ^a   Hu, Fengchun ^a   Wu, Lihui ^a   Liu, Qinghua ^a   Wei, Shiqiang ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

^b UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

^c SHANGHAI INSTITUTE OF CERAMICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CORRELATED MATERIALS; CRITICAL TEMPERATURES; DENSITY-FUNCTIONAL THEORY CALCULATIONS; ELECTRON-LATTICE INTERACTIONS; IN-SITU; INSULATING BANDS; KEY FACTORS; KINETIC PROCESS; METALLIZATIONS; PHYSICAL NATURE; STRUCTURAL KINETICS; STRUCTURAL REARRANGEMENT; TEMPERATURE DEPENDENT; TETRAGONAL PHASE; TWISTING ANGLE; X RAY ABSORPTION FINE STRUCTURES;

DENSITY FUNCTIONAL THEORY; ELECTRONIC STRUCTURE; METAL INSULATOR BOUNDARIES; SEMICONDUCTOR INSULATOR BOUNDARIES;

METAL INSULATOR TRANSITION;

EID: 78649340773     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.105.226405     Document Type: Article

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