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Volumn 45, Issue 12, 2010, Pages 1960-1963
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In situ etching WO3 nanoplates: Hydrothermal synthesis, photoluminescence and gas sensor properties
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Author keywords
A. Oxides; B. Crystal growth; C. X ray diffraction; D. Electrical properties
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Indexed keywords
A. OXIDES;
B. CRYSTAL GROWTH;
ELECTRICAL PROPERTY;
FORMATION MECHANISM;
GAS SENSITIVITY;
GAS SENSORS;
HIGH SENSITIVITY;
HYDROTHERMAL PROCESS;
IN-SITU ETCHING;
LATERAL SIZES;
LOW TEMPERATURES;
NANO-PLATE;
NANOPLATES;
OPERATION TEMPERATURE;
P-NITROBENZOIC ACIDS;
QUICK RESPONSE;
RECOVERY TIME;
SCANNING ELECTRONS;
SEM;
STRUCTURE DIRECTING AGENTS;
TEM;
TRANSMISSION ELECTRON;
ACETONE;
ACIDS;
CARBOXYLIC ACIDS;
CRYSTAL GROWTH;
CRYSTALLIZATION;
DIFFRACTION;
ETHANOL;
GAS DETECTORS;
GAS SENSING ELECTRODES;
HYDROTHERMAL SYNTHESIS;
NANOSTRUCTURES;
OPTICAL PROPERTIES;
PHOTOLUMINESCENCE;
SENSORS;
X RAY DIFFRACTION;
X RAYS;
ELECTRIC PROPERTIES;
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EID: 78649316571
PISSN: 00255408
EISSN: None
Source Type: Journal
DOI: 10.1016/j.materresbull.2010.08.011 Document Type: Article |
Times cited : (49)
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References (23)
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