A large uniform monolayer area obtained by droplet evaporation in microwells

2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010

Volumn , Issue , 2010, Pages 199-202

  Lin, Yu Ying ^a   Tseng, Fan Gang ^a   Yao, Da Jeng ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Evaporation; Microwell; Nanosphere lithography; Self assembly monolayer

Indexed keywords

A-PLANE; COLLOIDAL CONCENTRATIONS; COLLOIDAL SUSPENSIONS; DROPLET EVAPORATION; DROPLET SIZES; GOLD FILM; GOLD NANOPARTICLES; MICRO WELLS; NANOSPHERE LITHOGRAPHY; POLYSTYRENE BEADS; SELF ASSEMBLY MONOLAYERS;

DROP FORMATION; EVAPORATION; GOLD COATINGS; LITHOGRAPHY; MICROCHANNELS; NANOSPHERES; POLYSTYRENES; SELF ASSEMBLY; SUBSTRATES; SUSPENSIONS (FLUIDS);

MONOLAYERS;

EID: 78649242946     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/NEMS.2010.5592189     Document Type: Conference Paper

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