Critical thickness for onset of plastic relaxation in (112̄2) and (202̄1) semipolar AlGaN heterostructures

Applied Physics Express

Volumn 3, Issue 11, 2010, Pages

  Young, Erin C ^a   Gallinat, Chad S ^a   Romanov, Alexey E ^a,b,c   Tyagi, Anurag ^a   Wu, Feng ^a   Speck, James S ^a  

^a University of California   (United States)

^b IOFFE INSTITUTE   (Russian Federation)

^c UNIVERSITY OF TARTU   (Estonia)

Author keywords

[No Author keywords available]

Indexed keywords

ALGAN; ALGAN FILMS; ALLOY COMPOSITIONS; CRITICAL THICKNESS; HETEROSTRUCTURES; HIGH RESOLUTION X RAY DIFFRACTION; LATTICE-MISMATCHED; MISFIT DISLOCATIONS; ORIENTED FILMS; PLASTIC RELAXATION; SEMIPOLAR; WURTZITE GAN;

EPITAXIAL GROWTH; GALLIUM NITRIDE; HETEROJUNCTIONS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; SHEAR STRESS; STRENGTH OF MATERIALS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; ZINC SULFIDE;

GALLIUM ALLOYS;

EID: 78549289829     PISSN: 18820778     EISSN: 18820786     Source Type: Journal    
DOI: 10.1143/APEX.3.111002     Document Type: Article

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