Materials processing with a tightly focused femtosecond laser vortex pulse

Optics Letters

Volumn 35, Issue 20, 2010, Pages 3417-3419

  Hnatovsky, Cyril ^a   Shvedov, Vladlen G ^a,b   Krolikowski, Wieslaw ^a   Rode, Andrei V ^a  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

^b TAURIDA NATIONAL V I VERNADSKY UNIVERSITY   (Ukraine)

Author keywords

[No Author keywords available]

Indexed keywords

FEMTO-SECOND LASER; FEMTOSECONDS; FOCUSED FEMTOSECOND LASERS; HIGH NA; MATERIAL MODIFICATIONS; MATERIALS PROCESSING; PULSE ENERGIES; RING SHAPED STRUCTURES; SODA LIME GLASS; UNIAXIAL ANISOTROPIC MEDIUM;

ANISOTROPIC MEDIA; LIGHT PROPAGATION; PULSED LASER APPLICATIONS; SILICA; THICKNESS MEASUREMENT; ULTRASHORT PULSES; VORTEX FLOW;

FUSED SILICA;

GLASS; SILICON DIOXIDE;

ANISOTROPY; CHEMISTRY; EQUIPMENT DESIGN; LASER; LETTER; LIGHT; METHODOLOGY; NANOTECHNOLOGY; OPTICS; SURFACE PROPERTY;

ANISOTROPY; EQUIPMENT DESIGN; GLASS; LASERS; LIGHT; NANOTECHNOLOGY; OPTICS AND PHOTONICS; SILICON DIOXIDE; SURFACE PROPERTIES;

EID: 78549235808     PISSN: 01469592     EISSN: 15394794     Source Type: Journal    
DOI: 10.1364/OL.35.003417     Document Type: Article

References (8)

1. A. Picón, J. Mompart, J. R. Vázquez de Aldana, L. Plaja, G. F. Calvo, and L. Roso, Opt. Express 18, 3660 (2010).
2. R. Ling-Ling, Q. Shi-Liang, and G. Zhong-Yi, Chin. Phys. B 19, 034204 (2010).
3. Y. Tokizane, K. Oka, and R. Morita, Opt. Express 17, 14518 (2009).
4. V. G. Shvedov, C. Hnatovsky, W. Krolikowski, and A. V. Rode, Opt. Lett. 35, 2660 (2010).
5. A. Volyar and T. Fadeyeva, Opt. Spectrosc. 96, 96 (2004).
6. A. Ben-Yakar and R. L. Byer, J. Appl. Phys. 96, 5316 (2004).
7. Y. Iketaki, T. Watanabe, N. Bokor, and M. Fujii, Opt. Lett. 32, 2357 (2007).
8. E. G. Gamaly, S. Juodkazis, K. Nishimura, H. Misawa, B. Luther-Davies, L. Hallo, P. Nicolai, and V. T. Tikhonchuk, Phys. Rev. B 73, 214101 (2006).