Development of experimental design models to predict Photo-Fenton oxidation of a commercially important naphthalene sulfonate and its organic carbon content

Chemical Engineering Journal

Volumn 165, Issue 2, 2010, Pages 597-606

  Arslan Alaton Idil, I ^a   Yalabik, Arzu Betul ^a   Olmez Hanci, Tugba ^a  

^a ISTANBUL TECHNICAL UNIVERSITY   (Turkey)

Author keywords

Advanced oxidation processes; Central composite design; K acid; Naphthalene sulfonates; Photo Fenton treatment; Response surface methodology

Indexed keywords

ADVANCED OXIDATION PROCESSES; CENTRAL COMPOSITE DESIGN; K-ACID; NAPHTHALENE SULFONATES; PHOTO-FENTON; RESPONSE SURFACE METHODOLOGY;

DESIGN; NAPHTHALENE; ORGANIC CARBON; OXIDATION; OXIDATION RESISTANCE; REGRESSION ANALYSIS; REMOVAL; STATISTICS; SULFUR COMPOUNDS; SURFACE PROPERTIES;

CHEMICAL OXYGEN DEMAND;

EID: 78349310580     PISSN: 13858947     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cej.2010.10.003     Document Type: Article

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