Study of the photoinduced surface relief modulation in photopolymers caused by illumination with a gaussian beam of light

Journal of Optics

Volumn 12, Issue 12, 2010, Pages

  Babeva, T ^a   Mackey, D ^b   Naydenova, I ^b   Martin, S ^b   Toal, V ^b  

^a CENTRAL LABORATORY OF PHOTOPROCESSES   (Bulgaria)

^b DUBLIN INSTITUTE OF TECHNOLOGY   (Ireland)

Author keywords

Diffusion; Photopolymer; Surface relief profile; Two way diffusion model

Indexed keywords

GAUSSIAN BEAMS; MONOMERS; PHOTOPOLYMERS;

COMPONENT CONCENTRATION; DIFFERENT DENSITIES; DIFFUSION MODEL; PHOTOINDUCED SURFACE RELIEFS; PHOTOPOLYMERIZABLE SYSTEMS; POLYMER CHAINS; SURFACE PROFILES; SURFACE RELIEFS;

DIFFUSION;

EID: 78349288061     PISSN: 20408978     EISSN: 20408986     Source Type: Journal    
DOI: 10.1088/2040-8978/12/12/124011     Document Type: Article

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