A diffusive air plasma in bi-directional nanosecond pulsed dielectric barrier discharge

Journal of Physics D: Applied Physics

Volumn 43, Issue 45, 2010, Pages

  Yang, De Zheng ^a   Wang, Wen Chun ^a   Li, Shou Zhe ^a   Song, Ying ^a   Nie, Dong Xia ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AIR PLASMAS; BI-DIRECTIONAL; DIELECTRIC BARRIER DISCHARGES; ELECTROMAGNETIC INTERFERENCE; GAS TEMPERATURE; NANOSECOND PULSED POWER; NEGATIVE PULSE; OPTICAL EMISSION SPECTRA; PEAK VOLTAGE; PHOTOCURRENT PULSE; PLATE ELECTRODES; POSITIVE PULSE; PULSED DIELECTRIC BARRIER DISCHARGES; TIME-RESOLVED SPECTRA; VOLTAGE PULSE;

ATMOSPHERIC PRESSURE; DIELECTRIC DEVICES; ELECTRIC POTENTIAL; ELECTROMAGNETIC PULSE; EMISSION SPECTROSCOPY; FLOW CONTROL;

ELECTRIC DISCHARGES;

EID: 78249269842     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/43/45/455202     Document Type: Article

References (24)

1. Ono R and Oda T 2001 IEEE Trans. Ind. Appl. 37 709
2. Sun B, Sato M and Clements J S 1997 J. Electrostat. 39 189
3. Bouziane A, Hidaka K, Taplamacioglu M C and Waters R T 1994 J. Phys. D: Appl. Phys. 27 320
4. Laan M and Paris P 1994 J. Phys. D: Appl. Phys. 27 970
5. Liu F, Wang W, Zheng W and Wang Y 2006 Eur. Phys. J. D 38 515
6. Horvath M and Kiss E 2005 J. Electrostat. 63 993
7. Ayan H et al 2009 J. Phys. D: Appl. Phys. 42 125202
8. Uddi M, Jiang N, Adamovich I V and Lempert W R 2009 J. Phys. D: Appl. Phys. 42 075205
9. Adamovich I V, Choi I, Jiang N, Kim J, Keshav S, Lempert W R, Mintusov E, Nishihara M, Samimy M and Uddi M 2009 Plasma Sources Sci. Technol. 18 034018
10. Mizuno A, Clements J S and Davis R H 1986 IEEE Trans. Ind. Appl. IA-22 516
11. Duten X, Packan D, Yu L, Laux C O and Kruger C H 2002 IEEE Trans. Plasma Sci. 30 178
12. Takaki K, Hosokawa M, Sasaki T, Mukaigawa S and Fujiwara T 2005 Appl. Phys. Lett. 86 151501
13. Korolev Yu D and Mesyats G A 1998 Physics of Pulsed Breakdown in Gases (Yekaterinburg: URO) chapter 6
14. Walsh J L, Liu D X, Iza F, Rong M Z and Kong M G 2010 J. Phys. D: Appl. Phys. 43 032001
15. Bruggeman P, Walsh J L, Schram D C, Leys C and Kong M G 2009 Plasma Sources Sci. Technol. 18 045023
16. Liu F, Huang G and Ganguly B 2010 Plasma Sources Sci. Technol. 19 045017
17. Shao T, Yan P, Long K and Zhang S 2008 IEEE Trans. Plasma Sci. 36 1358
18. Ayan H et al 2008 IEEE Trans. Plasma Sci. 36 504
19. Pai D, Lacoste D A and Laux C O 2008 IEEE 35th Int. Conf. on Plasma Science (Karlsruhe, Germany) pp 15-19
20. Pai D, Lacoste D A and Laux C O 2008 IEEE Trans. Plasma Sci. 36 974
21. Nasser E 1971 Fundamentals of Gaseous Ionization and Plasma Electronics (New York: Wiley-Interscience) chapter 11
22. Luo S C, Denning M and Scharer J E 2008 J. Appl. Phys. 104 013301
23. Laux C O, Spencer T G, Kruger C H and Zare R N 2003 Plasma Sources Sci. Technol. 12 125
24. Raizer Y P 1991 Gas Discharge Physics (Berlin: Springer) chapter 12