"Water-cycle" mechanism for writing and erasing nanostructures at the LaAlO3/SrTiO3 interface

Applied Physics Letters

Volumn 97, Issue 17, 2010, Pages

  Bi, Feng ^a   Bogorin, Daniela F ^a   Cen, Cheng ^a   Bark, Chung Wung ^b   Park, Jae Wan ^b   Eom, Chang Beom ^b   Levy, Jeremy ^a  

^a UNIVERSITY OF PITTSBURGH   (United States)

^b University of Wisconsin Madison   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; AFM PROBE; CONDUCTIVE ATOMIC FORCE MICROSCOPES; HETEROSTRUCTURES; HUMID AIR; NANOSCALE CONTROL; SRTIO; WRITING ABILITIES; WRITING PROCESS;

INERT GASES; LANTHANUM ALLOYS; METAL INSULATOR BOUNDARIES; PROBES; SEMICONDUCTOR INSULATOR BOUNDARIES; STRONTIUM ALLOYS; VACUUM;

METAL INSULATOR TRANSITION;

EID: 78149451367     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3506509     Document Type: Article

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