Multilayered Al/CuO thermite formation by reactive magnetron sputtering: Nano versus micro

Journal of Applied Physics

Volumn 108, Issue 8, 2010, Pages

  Petrantoni, M ^a,b   Rossi, C ^a,b   Salvagnac, L ^a,b   Conedera V ^a,b   Esteve A ^a,b   Tenailleau, C ^b,c   Alphonse, P ^c   Chabal, Y J ^d  

^a LAAS CNRS   (France)

^b UNIVERSITÉ PAUL SABATIER   (France)

^c INSTITUT CARNOT CIRIMAT   (France)

^d The University of Texas at Dallas   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CU TARGET; DC REACTIVE MAGNETRON SPUTTERING; HEAT OF REACTION; HIGHER TEMPERATURES; LAYERED MATERIAL; LOW STRESS; MICROSTRUCTURED; MICROSTRUCTURED MATERIALS; MULTI-LAYERED; NANO-STRUCTURED; NANOENERGETIC MATERIALS; NANOSTRUCTURED MULTILAYERS; OXYGEN GAS MIXTURE; OXYGEN PARTIAL PRESSURE; PURE AL; REACTION TEMPERATURE; REACTIVE MAGNETRON SPUTTERING; THERMAL ANALYSIS; THERMITES;

ARGON; DIFFERENTIAL SCANNING CALORIMETRY; MULTILAYERS; THERMOANALYSIS;

OXYGEN;

EID: 78149448143     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3498821     Document Type: Article

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