Systematic optimisation of process parameters in laser drilling of 200 μm photovoltaic silicon wafers using new kind of nanosecond IR lasers

Journal of Laser Micro Nanoengineering

Volumn 4, Issue 3, 2009, Pages 231-233

  Stolberg, Klaus Peter ^a   Kremser, Bert ^a   Friedel, Susanna ^a   Atsuta, Yuuki ^b  

^a JENOPTIK Laser Optik Systeme GmbH   (Germany)

^b Optopia CoLtd   (Japan)

Author keywords

Back contact; Lamp2009; Laser drilling; Monocrystalline silicon; Mwt; PV cell; Solar cell

Indexed keywords

MONOCRYSTALLINE SILICON; PHOTOVOLTAIC CELLS; SILICON; SOLAR CELLS;

BACK CONTACT; LAMP2009; LASER DRILLING; MWT; PV CELLS;

SILICON WAFERS;

EID: 78149382470     PISSN: None     EISSN: 18800688     Source Type: Journal    
DOI: 10.2961/jlmn.2009.03.0017     Document Type: Article

References (5)

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3. M. Leitner, E. Körner, Stuttgarter Lasertage, Stuttgart, (2003).
4. A. Grohe at al., Proc. 22nd European Photovoltaic So-lar Energy Conference, Milano, (2007).
5. M. Leitner, K. Stolberg, Proc. 6. Jenaer Lasertagung, Jena, (2008).