An analytical method to quantify silica nanoparticles accumulated on the surface of polymer nanocomposites exposed to UV radiation

Nanotechnology 2010: Advanced Materials, CNTs, Particles, Films and Composites - Technical Proceedings of the 2010 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2010

Volumn 1, Issue , 2010, Pages 728-731

  Rabb, Savelas A ^a   Yu, Lee L ^a   Bernard, Coralie ^b   Nguyen, Tinh ^b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b Building and Fire Research Laboratory   (United States)

Author keywords

ICP OES; Nanocomposites; Release rate; Silica nanoparticles

Indexed keywords

ANALYTICAL METHOD; CONTROLLED DEGRADATION; DIFFERENT MASS; EXPOSURE CONDITIONS; ICP-OES; INDUCTIVELY COUPLED PLASMA-OPTICAL EMISSION SPECTROSCOPY; IRRADIATED POLYMERS; MASS FRACTION; NANO-SILICA; POLYMER NANOCOMPOSITE; RADIATION DOSE; RELEASE RATE; SENSITIVE METHOD; SILICA NANOPARTICLES; ULTRA-VIOLET; UV EXPOSURE; UV RADIATION;

ELECTROMAGNETIC INDUCTION; EMISSION SPECTROSCOPY; HUMIDITY CONTROL; INDUCTIVELY COUPLED PLASMA; NANOCOMPOSITES; NANOPARTICLES; NANOTECHNOLOGY; OPTICAL EMISSION SPECTROSCOPY; SILICA; ULTRAVIOLET RADIATION;

FILMS;

EID: 78049450067     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)

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