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Volumn 20, Issue 10, 2010, Pages

SOI/elastomer process for energy storage and rapid release

Author keywords

[No Author keywords available]

Indexed keywords

ADHESIVE PROPERTIES; DEEP REACTIVE ION ETCHING; FABRICATION PROCESS; HIGH ASPECT RATIO; IN-PLANE; MICRO-MECHANICAL; NONLINEAR STRAIN; RAPID RELEASE; SILICON ON INSULATOR WAFERS; SOFT ELASTOMERS; THREE-MASK PROCESS; YOUNG'S MODULUS;

EID: 78049422588     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/20/10/104011     Document Type: Article
Times cited : (24)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.