Molecular beam deposition of nanoscale ionic liquids in ultrahigh vacuum

ACS Nano

Volumn 4, Issue 10, 2010, Pages 5946-5952

  Maruyama, Shingo ^a   Takeyama, Yoko ^a   Taniguchi, Hiroki ^a   Fukumoto, Hiroki ^a   Itoh, Mitsuru ^a   Kumigashira, Hiroshi ^b   Oshima, Masaharu ^b   Yamamoto, Takakazu ^a   Matsumoto, Yuji ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

Author keywords

CW IR laser deposition; fractional distillation; ionic liquids; liquid thin film; nanodroplets

Indexed keywords

CONTINUOUS WAVE; DEPOSITION PROCESS; FRACTIONAL DISTILLATION; HIGH SPATIAL RESOLUTION; IN-VACUUM; IR LASERS; LASER DEPOSITION TECHNIQUE; LIQUID THIN FILM; MOLECULAR BEAM DEPOSITION; NANO SCALE; NANO-DROPLETS; NANODROPLET; NEW APPROACHES; PURIFICATION METHOD; SINGLE DROPLET; TIME OF FLIGHT MASS SPECTROMETRY;

BINARY MIXTURES; CHEMICAL MODIFICATION; DEPOSITION; DISTILLATION; DROP FORMATION; ELECTROSPRAY IONIZATION; FLOW OF WATER; INFRARED LASERS; IONS; MAGNETIC RESONANCE; MASS SPECTROMETRY; MOLECULAR BEAMS; RAMAN SPECTROSCOPY; THERMAL EVAPORATION; THERMOCHEMISTRY; ULTRAHIGH VACUUM; ULTRATHIN FILMS; VACUUM EVAPORATION;

IONIC LIQUIDS;

EID: 78049330205     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn101036v     Document Type: Article

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