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Volumn 157, Issue 6, 2010, Pages

Growth mechanism of the copper oxide nanowires from copper thin films deposited on CuO-buffered silicon substrate

Author keywords

[No Author keywords available]

Indexed keywords

AIR AMBIENT; COPPER FILMS; COPPER THIN FILM; DEVICE APPLICATION; GROWTH MECHANISMS; HIGH TEMPERATURE; LONG DURATION; SI SUBSTRATES; SILICON SUBSTRATES; SINGLE CRYSTAL NANOWIRES; TWO-STEP PROCESS;

EID: 77958596569     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3365058     Document Type: Article
Times cited : (37)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.