Impact of accompanying hydrogen generation on metal nanotube electrodeposition

Journal of the Electrochemical Society

Volumn 157, Issue 6, 2010, Pages

  Motoyama, Munekazu ^a   Fukunaka, Yasuhiro ^b   Ogata, Yukio H ^b   Prinz, Friedrich B ^a  

^a Stanford University   (United States)

^b KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BULK SOLUTIONS; CATHODE SURFACE; CATHODIC POTENTIALS; CURRENT EFFICIENCY; HYDROGEN GENERATIONS; INDUCTIVELY COUPLED PLASMA EMISSION SPECTROMETRY; MEMBRANE PORES; NANOTUBE GROWTH; NANOTUBE WALLS; NUMERICAL MODELS; PH VALUE; PLANAR CATHODE SURFACE; PLANAR CATHODES; POROUS MEMBRANES; POROUS TEMPLATES; TRANSMISSION ELECTRON MICROSCOPE;

ELECTRODEPOSITION; ELECTROMAGNETIC INDUCTION; HYDROGEN PRODUCTION; INDUCTIVELY COUPLED PLASMA; NANOWIRES; PH EFFECTS; TRANSMISSION ELECTRON MICROSCOPY;

NANOTUBES;

EID: 77958520349     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3365038     Document Type: Article

References (66)

1. T. M. Whitney, J. S. Jiang, P. C. Searson, and C. L. Chien, Science SCIEAS 0036-8075, 261, 1316 (1993). 10.1126/science.261.5126.1316
2. K. Nielsch, R. B. Wehrspohn, J. Barthel, J. Kirschner, S. F. Fischer, H. Kronmüller, T. Schweinböck, D. Weiss, and U. Gösele, J. Magn. Magn. Mater. JMMMDC 0304-8853, 249, 234 (2002). 10.1016/S0304-8853(02)00536-X (Pubitemid 35263318)
3. L. Sun, Y. Hao, C. -L. Chien, and P. C. Searson, IBM J. Res. Dev. IBMJAE 0018-8646, 49, 79 (2005).
4. H. Oshima, H. Kikuchi, H. Nakao, K. Itoh, T. Kamimura, T. Morikawa, K. Matsumoto, T. Umada, H. Tamura, K. Nishio, Appl. Phys. Lett. APPLAB 0003-6951, 91, 022508 (2007). 10.1063/1.2757118 (Pubitemid 47114750)
5. C. W. Xu, H. Wang, P. K. Shen, and S. P. Jiang, Adv. Mater. ADVMEW 0935-9648, 19, 4256 (2007). 10.1002/adma.200602911 (Pubitemid 350254807)
6. X. Zhang, W. Lu, J. Da, H. Wang, D. Zhao, and P. A. Webley, Chem. Commun. (Cambridge) CHCOFS 1359-7345, 2009, 195.
7. Z. Liu and P. C. Searson, J. Phys. Chem. B JPCBFK 1089-5647, 110, 4318 (2006). 10.1021/jp056940t
8. A. Andreu, J. W. Merkert, L. A. Lecaros, B. L. Broglin, J. T. Brazell, and M. El-Kouedi, Sens. Actuators B SABCEB 0925-4005, 114, 1116 (2006). 10.1016/j.snb.2005.07.072
9. C. G. Zoski, N. Yang, P. He, L. Berdondini, and M. Koudelka-Hep, Anal. Chem. ANCHAM 0003-2700, 79, 1474 (2007). 10.1021/ac0619534
10. G. Tourillon, L. Pontonnier, J. P. Levy, and V. Langlais, Electrochem. Solid-State Lett. ESLEF6 1099-0062, 3, 20 (1999). 10.1149/1.1390946
11. J. Verbeeck, O. I. Lebedev, G. Van Tendeloo, L. Cagnon, C. Bougerol, and G. Tourillon, J. Electrochem. Soc. JESOAN 0013-4651, 150, E468 (2003). 10.1149/1.1601230
12. W. -C. Yoo and J. -K. Lee, Adv. Mater. ADVMEW 0935-9648, 16, 1097 (2004). 10.1002/adma.200306595
13. Q. Wang, G. Wang, X. Han, X. Wang, and J. G. Hou, J. Phys. Chem. B JPCBFK 1089-5647, 109, 23326 (2005). 10.1021/jp0530202 (Pubitemid 43081502)
14. T. Chowdhury, D. P. Casey, and J. F. Rohan, Electrochem. Commun. ECCMF9 1388-2481, 11, 1203 (2009). 10.1016/j.elecom.2009.04.003
15. Y. Fukunaka, M. Motoyama, Y. Konishi, and R. Ishii, Electrochem. Solid-State Lett. ESLEF6 1099-0062, 9, C62 (2006). 10.1149/1.2165711 (Pubitemid 43121732)
16. D. M. Davis and E. J. Podlaha, Electrochem. Solid-State Lett. ESLEF6 1099-0062, 8, D1 (2005). 10.1149/1.1847681 (Pubitemid 40214035)
17. L. Philippe and J. Michler, Small SMALBC 1613-6810, 4, 904 (2008). 10.1002/smll.200800103
18. H. Cao, L. Wang, Y. Qiu, Q. Wu, G. Wang, L. Zhang, and X. Liu, ChemPhysChem CPCHFT 1439-4235, 7, 1500 (2006). 10.1002/cphc.200500690
19. C. -C. Hu, K. -H. Chang, M. -C. Lin, and Y. -T. Wu, Nano Lett. NALEFD 1530-6984, 6, 2690 (2006). 10.1021/nl061576a (Pubitemid 46129558)
20. M. Nishizawa, V. P. Menon, and C. R. Martin, Science SCIEAS 0036-8075, 268, 700 (1995). 10.1126/science.268.5211.700
21. F. Q. Zhu, D. Fan, X. Zhu, J. -G. Zhu, R. C. Cammarate, and C. -L. Chien, Adv. Mater. ADVMEW 0935-9648, 16, 2155 (2004). 10.1002/adma.200400675 (Pubitemid 40072914)
22. C. J. Brumlik and C. R. Martin, J. Am. Chem. Soc. JACSAT 0002-7863, 113, 3174 (1991). 10.1021/ja00008a057
23. V. P. Menon and C. R. Martin, Anal. Chem. ANCHAM 0003-2700, 67, 1920 (1995). 10.1021/ac00109a003
24. J. Bao, C. Tie, Z. Xu, Q. Zhou, D. Shen, and Q. Ma, Adv. Mater. ADVMEW 0935-9648, 13, 1631 (2001). 10.1002/1521-4095(200111)13:21<1631::AID- ADMA1631>3.0.CO;2-R
25. N. Q. Minh, J. Am. Ceram. Soc. JACTAW 0002-7820, 76, 563 (1993). 10.1111/j.1151-2916.1993.tb03645.x
26. S. Kang, P. C. Su, Y. L. Park, Y. Saito, and F. B. Prinz, J. Electrochem. Soc. JESOAN 0013-4651, 153, A554 (2006). 10.1149/1.2164769 (Pubitemid 43201436)
27. M. A. Pea, J. P. Gómez, and J. L. G. Fierro, Appl. Catal., A ACAGE4 0926-860X, 144, 7 (1996). 10.1016/0926-860X(96)00108-1
28. P. Serp, M. Corrias, and P. Kalck, Appl. Catal., A ACAGE4 0926-860X, 253, 337 (2003). 10.1016/S0926-860X(03)00549-0
29. J. O'M. Bockris and E. C. Potter, J. Chem. Phys. JCPSA6 0021-9606, 20, 614 (1952). 10.1063/1.1700503
30. M. Motoyama, Y. Fukunaka, T. Sakka, and Y. H. Ogata, J. Electrochem. Soc. JESOAN 0013-4651, 153, C502 (2006). 10.1149/1.2196672 (Pubitemid 43838697)
31. Y. Konishi, M. Motoyama, H. Matsushima, Y. Fukunaka, R. Ishii, and Y. Ito, J. Electroanal. Chem. JECHES 0022-0728, 559, 149 (2003). 10.1016/S0022-0728(03)00157-8
32. M. Motoyama, Y. Fukunaka, T. Sakka, Y. H. Ogata, and S. Kikuchi, J. Electroanal. Chem. JECHES 0022-0728, 584, 84 (2005). 10.1016/j.jelechem.2005.07. 023 (Pubitemid 41394182)
33. A. K. Graham, Electroplating Engineering Handbook, p. xii, Van Nostrand Reinhold, New York (1972).
34. A. M. Alfantazi and A. Shakshouki, J. Electrochem. Soc. JESOAN 0013-4651, 149, C506 (2002). 10.1149/1.1506933 (Pubitemid 35298696)
35. C. R. Martin, M. Nishizawa, K. Jirage, M. Kang, and S. B. Lee, Adv. Mater. ADVMEW 0935-9648, 13, 1351 (2001). 10.1002/1521-4095(200109)13: 18<1351::AID-ADMA1351>3.0.CO;2-W
36. J. B. Edel and A. J. de Mello, Nanofluidics: Nanoscience and Nanotechnology, Royal Society of Chemistry, Cambridge, UK (2009).
37. Z. Li and B. C.-Y. Lu, Chem. Eng. Sci. CESCAC 0009-2509, 56, 2879 (2001). 10.1016/S0009-2509(00)00525-X
38. C. E. Brennen, Cavitation and Bubble Dynamics, Oxford University Press, New York (1995).
39. Y. Fukunaka, K. Suzuki, A. Ueda, and Y. Kondo, J. Electrochem. Soc. JESOAN 0013-4651, 136, 1002 (1989). 10.1149/1.2096773
40. Y. Fukunaka, T. Minegishi, N. Nishioka, and Y. Kondo, J. Electrochem. Soc. JESOAN 0013-4651, 128, 1274 (1981). 10.1149/1.2127606
41. S. Valizadeh, J. M. George, P. Leisner, and L. Hultman, Electrochim. Acta ELCAAV 0013-4686, 47, 865 (2001). 10.1016/S0013-4686(01)00797-6 (Pubitemid 33127944)
42. M. Avrami, J. Chem. Phys. JCPSA6 0021-9606, 7, 1103 (1939) 10.1063/1.1750380
43. M. Avrami, J. Chem. Phys. JCPSA6 0021-9606, 8, 212 (1940) 10.1063/1.1750631
44. M. Avrami, J. Chem. Phys. JCPSA6 0021-9606, 9, 177 (1941). 10.1063/1.1750872
45. B. Scharifker and G. Hills, Electrochim. Acta ELCAAV 0013-4686, 28, 879 (1983). 10.1016/0013-4686(83)85163-9
46. B. R. Scharifker, J. Electroanal. Chem. JECHES 0022-0728, 240, 61 (1988). 10.1016/0022-0728(88)80313-9
47. A. Milchev, W. S. Kruijt, M. Sluyters-Rehbach, and J. H. Sluyters, J. Electroanal. Chem. JECHES 0022-0728, 350, 89 (1993). 10.1016/0022-0728(93)80198- Q
48. C. Schönenberger, B. M. I. van der Zande, L. G. J. Fokkink, M. Henny, C. Schmid, M. Krüger, A. Bachtold, R. Huber, H. Birk, and U. Staufer, J. Phys. Chem. B JPCBFK 1089-5647, 101, 5497 (1997). 10.1021/jp963938g
49. C. Wagner, J. Electrochem. Soc. JESOAN 0013-4651, 95, 161 (1949). 10.1149/1.2776746
50. C. R. Wilke, M. Eisenberg, and C. W. Tobias, J. Electrochem. Soc. JESOAN 0013-4651, 100, 513 (1953). 10.1149/1.2780889
51. Y. Fukunaka, T. Yamamoto, and Y. Kondo, Electrochim. Acta ELCAAV 0013-4686, 34, 1393 (1989). 10.1016/0013-4686(89)87177-4
52. Y. Fukunaka, K. Denpo, M. Iwata, K. Maruoka, and Y. Kondo, J. Electrochem. Soc. JESOAN 0013-4651, 130, 2492 (1983). 10.1149/1.2119621
53. K. Denpo, T. Okumura, Y. Fukunaka, and Y. Kondo, J. Electrochem. Soc. JESOAN 0013-4651, 132, 1145 (1985). 10.1149/1.2114030
54. M. Poubaix, Atlas of Electrochemical Equilibria in Aqueous Solutions, Pergamon, London (1966).
55. J. Horkans, J. Electrochem. Soc. JESOAN 0013-4651, 126, 1861 (1979). 10.1149/1.2128816
56. J. P. Hoare, J. Electrochem. Soc. JESOAN 0013-4651, 133, 2491 (1986) 10.1149/1.2108456
57. J. P. Hoare, J. Electrochem. Soc. JESOAN 0013-4651, 134, 3102 (1987). 10.1149/1.2100348
58. M. Murthy, G. S. Nagarajan, J. W. Weidner, and J. W. Van Zee, J. Electrochem. Soc. JESOAN 0013-4651, 143, 2319 (1996). 10.1149/1.1837000
59. H. Dahms and I. M. Croll, J. Electrochem. Soc. JESOAN 0013-4651, 112, 771 (1965). 10.1149/1.2423692
60. S. Hessami and C. W. Tobias, J. Electrochem. Soc. JESOAN 0013-4651, 136, 3611 (1989). 10.1149/1.2096519
61. J. K. Park and K. J. Lee, J. Chem. Eng. Data JCEAAX 0021-9568, 39, 891 (1994). 10.1021/je00016a057
62. H. Vogt, J. Appl. Electrochem. JAELBJ 0021-891X, 25, 764 (1995). 10.1007/BF00648631
63. W. -C. Tsai, C. -C. Wan, and Y. -Y. Wang, J. Appl. Electrochem. JAELBJ 0021-891X, 32, 1371 (2002). 10.1023/A:1022649314480
64. M. Motoyama, T. Sakka, Y. H. Ogata, and Y. Fukunaka, Electrochim. Acta ELCAAV 0013-4686, 53, 205 (2007). 10.1016/j.electacta.2007.04.122 (Pubitemid 47391481)
65. G. C. Han, B. Y. Zong, P. Luo, and Y. H. Wu, J. Appl. Phys. JAPIAU 0021-8979, 93, 9202 (2003). 10.1063/1.1572197
66. F. E. Atalay, H. Kaya, S. Atalay, and S. Tari, J. Alloys Compd. JALCEU 0925-8388, 469, 458 (2009). 10.1016/j.jallcom.2008.01.141