Light emission from silicon/gold nanoparticle systems

Applied Physics Letters

Volumn 97, Issue 14, 2010, Pages

  Bassu, M ^a   Strambini, M L ^a   Barillaro, G ^a   Fuso, F ^a  

^a UNIVERSITY OF PISA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ETCHING; ENHANCED EMISSION; GOLD NANOPARTICLES; GOLD NANOSTRUCTURES; GOLD PARTICLES; LOCALIZED PLASMON RESONANCE; LOW TEMPERATURES; NANO-STRUCTURED; NANOCRYSTALS AND NANOPARTICLES; NANOPARTICLE SYSTEMS; OPTICAL COUPLINGS; PULSED EXCITATION; SELECTIVE ETCHING; SILICON NANOCRYSTALS; SURFACE MODIFICATION;

ETCHING; NANOCRYSTALS; NANOPARTICLES; PHOTOLUMINESCENCE SPECTROSCOPY; SEMICONDUCTING SILICON COMPOUNDS;

GOLD;

EID: 77958064432     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3483617     Document Type: Article

References (22)

1. J. -Y. Yoon, M. -S. Kim, J. -Y. Lee, and J. -H. Yoon, Nanotechnology NNOTER 0957-4484 16, 1372 (2005). 10.1088/0957-4484/16/8/066 (Pubitemid 40878652)
2. A. Alqudami and S. Annapoorni, Plasmonics ZZZZZZ 1557-1955 2, 5 (2007). 10.1007/s11468-006-9019-2 (Pubitemid 46364945)
3. J. S. Biteen, D. Pacifici, N. S. Lewis, and H. A. Atwater, Nano Lett. NALEFD 1530-6984 5, 1768 (2005). 10.1021/nl051207z (Pubitemid 41396162)
4. R. P. Devaty and A. J. Sievers, Phys. Rev. B PLRBAQ 0556-2805 31, 2427 (1985). 10.1103/PhysRevB.31.2427
5. S. -K. Eah, H. M. Jaeger, N. F. Scherer, G. P. Wiederrecht, and X. -M. Lin, Appl. Phys. Lett. APPLAB 0003-6951 86, 031902 (2005). 10.1063/1.1851011 (Pubitemid 40493449)
6. C. Langhammer, Z. Yuan, I. Zorić, and B. Kasemo, Nano Lett. NALEFD 1530-6984 6, 833 (2006). 10.1021/nl060219x
7. M. M. Alvarez, J. T. Khoury, T. G. Schaaff, M. N. Shafigullin, I. Vezmar, and R. L. Whetten, J. Phys. Chem. B JPCBFK 1089-5647 101, 3706 (1997). 10.1021/jp962922n
8. X. Li and P. W. Bohn, Appl. Phys. Lett. APPLAB 0003-6951 77, 2572 (2000). 10.1063/1.1319191
9. N. Ferralis, R. Maboudian, and C. Carraro, J. Am. Chem. Soc. JACSAT 0002-7863 130, 2681 (2008). 10.1021/ja7101983 (Pubitemid 351304784)
10. S. Chattopadhyay, X. Li, and P. W. Bohn, J. Appl. Phys. JAPIAU 0021-8979 91, 6134 (2002). 10.1063/1.1465123 (Pubitemid 34562285)
11. X. Hu, Y. Huang, W. Zhang, and J. Peng, Appl. Phys. Lett. APPLAB 0003-6951 89, 081112 (2006). 10.1063/1.2336215 (Pubitemid 44286106)
12. K. W. Liu, Y. D. Tang, C. X. Cong, T. C. Sum, A. C. H. Huan, Z. X. Shen, L. Wang, F. Y. Jiang, X. W. Sun, and H. D. Sun, Appl. Phys. Lett. APPLAB 0003-6951 94, 151102 (2009). 10.1063/1.3116617
13. H. Koyama, T. Ozali, and N. Koshida, Phys. Rev. B PLRBAQ 0556-2805 52, R11561 (1995). 10.1103/PhysRevB.52.R11561
14. www.philiplaven.com.
15. W. Theiβ, S. Henkel, and M. Arntzen, Thin Solid Films THSFAP 0040-6090 255, 177 (1995).
16. Z. ukasiak, P. Dalasiński, and W. Baa, Opto-Electron. Rev. OELREM 1230-3402 11, 113 (2003).
17. T. Hadjersi, N. Gabouze, N. Yamamoto, C. Bennazzouz, and H. Cheraga, Vacuum VACUAV 0042-207X 80, 366 (2005). 10.1016/j.vacuum.2005.06.013 (Pubitemid 41423534)
18. J. Gersten and A. Nitzan, J. Chem. Phys. JCPSA6 0021-9606 75, 1139 (1981). 10.1063/1.442161
19. R. Carminati, J. -J. Greffet, C. Henkel, and J. M. Vigoureux, Opt. Commun. OPCOB8 0030-4018 261, 368 (2006). 10.1016/j.optcom.2005.12.009
20. D. Kovalev, J. Diener, H. Hecker, G. Polisski, N. Künzner, and F. Koch, Phys. Rev. B PLRBAQ 0556-2805 61, 4485 (2000). 10.1103/PhysRevB.61.4485
21. W. -H. Li, S. Y. Wu, C. C. Yang, S. K. Lai, K. C. Lee, H. L. Huang, and H. D. Yang, Phys. Rev. Lett. PRLTAO 0031-9007 89, 135504 (2002). 10.1103/PhysRevLett.89.135504
22. W. -H. Li, S. Y. Wu, C. C. Yang, F. C. Tsao, S. K. Lai, and K. C. Lee, Synth. Met. SYMEDZ 0379-6779 135-136, 811 (2003). 10.1016/S0379-6779(02)00885-8 (Pubitemid 41055840)