Long range pinning interaction in ultra-thin insulator-inserted metal/germanium junctions

2010 Silicon Nanoelectronics Workshop, SNW 2010

Volumn , Issue , 2010, Pages

  Nishimura, T ^a,b   Kita, K ^a,b   Nagashio, K ^a,b   Toriumi, A ^a,b  

^a UNIVERSITY OF TOKYO   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FERMI LEVEL PINNING; LONG RANGE; PINNING INTERACTION; ULTRATHIN INSULATORS;

DANGLING BONDS; NANOELECTRONICS;

GERMANIUM;

EID: 77957994368     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SNW.2010.5562590     Document Type: Conference Paper

References (9)

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7. M. Kobayashi, et al., VLSI Symp. 2008.
8. D. Connelly, et al., APL 88, 012105 (2006).
9. J. Robertson, IEDM 2009.