Fabrication of novel Ag nanowires/poly(vinylidene fluoride) nanocomposite film with high dielectric constant

Physica Status Solidi (A) Applications and Materials Science

Volumn 207, Issue 8, 2010, Pages 1870-1873

  Zheng, Wei ^a   Lu, Xiaofeng ^a   Wang, Wei ^a   Wang, Zhaojie ^a   Song, Mingxin ^a   Wang, Yu ^a   Wang, Ce ^a  

^a JILIN UNIVERSITY   (China)

Author keywords

Composite materials; Dielectric properties; Nanowires

Indexed keywords

AG NANOWIRES; CASTING METHOD; DIELECTRIC CONSTANTS; EFFECTIVE DIELECTRIC CONSTANTS; HIGH DIELECTRIC CONSTANTS; LOW DIELECTRIC LOSS; LOW FREQUENCY RANGE; NANOCOMPOSITE FILM; PERCOLATION THRESHOLDS; PROPERTIES OF COMPOSITES; ROOM TEMPERATURE; UNIFORM DISPERSIONS; VINYLIDENE FLUORIDE;

COMPOSITE FILMS; DIELECTRIC LOSSES; DIELECTRIC MATERIALS; DIELECTRIC PROPERTIES OF SOLIDS; MATERIALS PROPERTIES; NANOCOMPOSITES; NANOWIRES; PERMITTIVITY; SCANNING ELECTRON MICROSCOPY; SOLVENTS; TITRATION;

SILVER;

EID: 77957965877     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200925520     Document Type: Article

References (16)

1. Q. M. Zhang, H. F. Li, M. Poh, H. S. Xu, Z.-Y. Cheng, F. Xia, and C. Huang, Nature 419, 284 (2002).
2. J. X. Lu, K. S. Moon, J. W. Xu, and C. P. Wong, J. Mater. Chem. 16, 1543 (2006).
3. C. N. Wen, Prog. Mater. Sci. 37, 1 (1993).
4. Y. Bai, Z.-Y. Cheng, V. Bharti, H. S. Xu, and Q. M. Zhang, Appl. Phys. Lett. 76, 3804 (2000).
5. Y. Rao and C. P. Wong, IEEE Proc. Electron. Compon. Technol. Conf. 920 (2002).
6. Z. M. Dang, Y. H. Lin, and C. W. Nan, Adv. Mater. 15, 1625 (2003).
7. L. Qi, B. I. Lee, S. H. Chen, W. D. Samuels, and G. J. Exarhos, Adv. Mater. 17, 1777 (2005).
8. Y. J. Li, M. Xu, J. Q. Feng, and Z. M. Dang, Appl. Phys. Lett. 89, 072902 (2006).
9. Y. G. Sun and Y. N. Xia, Adv. Mater. 14, 833 (2002).
10. P. Jiang, S. Y. Li, S. S. Xie, Y. Gao, and L. Song, Chem. Eur. J. 10, 4817 (2004).
11. J. Q. Huang, H. Zheng, Z. H. Chen, Q. Gao, N. Ma, and P. Y. Du, J. Mater. Chem. 19, 3909 (2009).
12. L. Wang and Z. M. Dang, Appl. Phys. Lett. 87, 042903 (2005).
13. X. Y. Huang, P. K. Jiang, and C. U. Kim, J. Appl. Phys. 102, 124103 (2007).
14. G. Sui, S. Jana, W. H. Zhong, M. A. Fuqua, and C. A. Ulven, Acta Mater. 56, 2381 (2008).
15. F. J. Wang, D. X. Zhou, and S. P. Gong, Phys. Status Solidi RRL 3, 22 (2009).
16. J. K. Yuan, Z. M. Dang, and J. B. Bai, Phys. Status Solidi RRL 2, 233 (2009).