Design-technology interaction for post-32 nm node CMOS technologies

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 2010, Pages 143-144

  Shahidi, Ghavam G ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

32-NM NODE; BODY EFFECT; CIRCUIT DESIGNS; CMOS TECHNOLOGY; COMPLEX DESIGNS; DEVICE TECHNOLOGIES; FREQUENCY-SCALING; POWER MANAGEMENTS; PRODUCT PERFORMANCE; TECHNOLOGY SOLUTIONS;

CMOS INTEGRATED CIRCUITS; DESIGN; ENERGY MANAGEMENT;

TECHNOLOGY;

EID: 77957873820     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/VLSIT.2010.5556204     Document Type: Conference Paper

References (5)

1. A. Khakifirooz, ISSCC 2010.
2. Y. Sun, to be presented Sym. VLSI Tech., 2010.
3. C.K. Hu, 11th Inter. Workshop on Metallization, 2010, Germany.
4. L. Liebmann, SPIE 2010 Short Course.
5. D. J. Frank, IBM JRD, 2006.