Preparation of boron-doped TiO2 films by autoclaved-sol method at low temperature and study on their photocatalytic activity

Thin Solid Films

Volumn 519, Issue 1, 2010, Pages 111-116

  Lu, Xiaona ^a   Tian, Baozhu ^a   Chen, Feng ^a   Zhang, Jinlong ^a,b  

^a EAST CHINA UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b GUIZHOU NORMAL UNIVERSITY   (China)

Author keywords

Boron; Doped oxides; Hydrothermal sol gel deposition; Photocatalysis; Rhodamine B; Titanium dioxide; X ray diffraction

Indexed keywords

ABSORPTION BAND; AFM; ANATASE PHASE; BORON ATOM; BORON-DOPED; CRYSTAL FORMS; DOPED OXIDES; HYDROTHERMAL SOL-GEL DEPOSITION; LOW TEMPERATURES; MATRIX; PHOTOCATALYTIC ACTIVITIES; PHOTOCATALYTIC CHARACTERISTICS; RED SHIFT; RHODAMINE B; TIO; TWO LAYERS; UV LIGHT; VISIBLE REGION; XPS; XRD;

BORON; DIFFRACTION; GELS; ORGANIC SOLVENTS; PHOTOCATALYSIS; SOL-GEL PROCESS; SOL-GELS; SOLS; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES; X RAY DIFFRACTION;

FILM PREPARATION;

EID: 77957719931     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.07.071     Document Type: Article

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