Electrochemical behavior of iridium oxide films in trifluoromethanesulfonic acid

Journal of the Electrochemical Society

Volumn 157, Issue 11, 2010, Pages

  Owe, Lars Erik ^a   Lervik, Ingrid Anne ^a,b   Tsypkin, Mikhail ^a   Syre, Marie Vardenr ^a,c   Sunde, Svein ^a  

^a NORWEGIAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Norway)

^b Axess AS   (Norway)

^c IFE   (Norway)

Author keywords

[No Author keywords available]

Indexed keywords

CHLORIDE IONS; ELECTROCHEMICAL BEHAVIORS; FARADAIC CURRENT; FLAT BAND; HIGHER-DEGREE; IRIDIUM OXIDES; METAL ELECTRODES; MODEL SYSTEM; OXIDATION CURRENTS; OXIDE SURFACE; OXYGEN EVOLUTION REACTION; POLYMER ELECTROLYTE MEMBRANES; RE-OXIDATION; REDOX BEHAVIOR; REDOX COUPLE; REDUCTION CURRENT; TRIFLATES; TRIFLUOROMETHANE SULFONIC ACID; WATER ELECTROLYSIS;

ADSORPTION; CHLORINE COMPOUNDS; ELECTROCHEMICAL PROPERTIES; ELECTROLYTES; HYDROGEN; IONS; IRIDIUM; IRIDIUM COMPOUNDS; ORGANIC COMPOUNDS; OXYGEN; REACTION RATES; SULFURIC ACID;

OXIDE FILMS;

EID: 77957719806     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3490671     Document Type: Article

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