Mechanism of photolytic decomposition of N-halamine antimicrobial siloxane coatings

ACS Applied Materials and Interfaces

Volumn 2, Issue 8, 2010, Pages 2456-2464

  Kocer, Hasan B ^a   Akdag, Akin ^b   Worley, S D ^b   Acevedo, Orlando ^a   Broughton, R M ^a   Wu, Yonnie ^b  

^a AUBURN UNIVERSITY   (United States)

^b AUBURN UNIVERSITY   (United States)

Author keywords

antimicrobial materials; decomposition products; N halamines; siloxanes; UVA irradiation

Indexed keywords

ANTIMICROBIAL MATERIALS; DECOMPOSITION PRODUCTS; N-HALAMINES; SILOXANES; UVA IRRADIATIONS;

CHLORINE COMPOUNDS; COATED MATERIALS; IRRADIATION; MICROORGANISMS; SILICON COMPOUNDS;

INORGANIC COATINGS;

ANTIINFECTIVE AGENT; BIOMATERIAL; CELLULOSE; CHLORIDE; SILOXANE;

ARTICLE; CHEMISTRY; ENTROPY; HYDROGEN BOND; PHOTOCHEMISTRY; ULTRAVIOLET RADIATION;

ANTI-INFECTIVE AGENTS; CELLULOSE; CHLORIDES; COATED MATERIALS, BIOCOMPATIBLE; ENTROPY; HYDROGEN BONDING; PHOTOCHEMISTRY; SILOXANES; ULTRAVIOLET RAYS;

EID: 77957664192     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am100511x     Document Type: Article

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