Ab initio-based diffusion theory and tracer diffusion in Ni-Cr and Ni-Fe alloys

Journal of Nuclear Materials

Volumn 405, Issue 3, 2010, Pages 216-234

  Tucker, J D ^a,b   Najafabadi, R ^b   Allen, T R ^a   Morgan, D ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

^b Knolls Atomic Power Laboratory   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AB INITIO; AB INITIO MODELING; ARRHENIUS; DIFFUSING SPECIES; DIFFUSION COEFFICIENTS; DIFFUSION DATA; DIFFUSION THEORY; DIFFUSIVITIES; ELECTRONIC CONTRIBUTIONS; ELECTRONIC EXCITATION EFFECT; INTERSTITIAL DEFECTS; INTERSTITIAL DIFFUSION; KINETIC INFORMATION; MIGRATION BARRIERS; MODELING RESULTS; NON-ARRHENIUS BEHAVIOR; PHENOMENOLOGICAL COEFFICIENTS; PREEXPONENTIAL FACTOR; SIGNIFICANT IMPACTS; SOLUTE DRAG; TEMPERATURE DEPENDENT; TRACER DIFFUSION; TRACER DIFFUSION COEFFICIENTS; VACANCY DIFFUSION MECHANISM; WEAK INTERACTIONS;

BINDING ENERGY; CERIUM ALLOYS; CHROMIUM; IRON ALLOYS; VACANCIES;

DIFFUSION;

EID: 77957241844     PISSN: 00223115     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnucmat.2010.08.003     Document Type: Article

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