Ion beam irradiation effects on resist materials

Journal of Photopolymer Science and Technology

Volumn 23, Issue 3, 2010, Pages 399-404

  Gowa, Tomoko ^a   Takahashi, Tomohiro ^a   Oka, Toshitaka ^b   Murakami, Takeshi ^c   Oshima, Akihiro ^d   Tagawa, Seiichi ^a,d   Washio, Masakazu ^a  

^a WASEDA UNIVERSITY   (Japan)

^b JAPAN ATOMIC ENERGY AGENCY   (Japan)

^c NATIONAL INSTITUTE OF RADIOLOGICAL SCIENCES   (Japan)

^d OSAKA UNIVERSITY   (Japan)

Author keywords

Focused ion beam (FIB); Heavy ion beam; Liner energy transfer (LET); Positive negative inversion; Resist

Indexed keywords

EID: 77957159738     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.23.399     Document Type: Article

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