Magnetization study on the field-induced quantum critical point in YbRh2Si2

Journal of Physics: Conference Series

Volumn 200, Issue SECTION 1, 2010, Pages

  Tokiwa, Y ^a,b   Geibel, C ^b   Steglich, F ^b   Gegenwart, P ^a  

^a UNIVERSITY OF GÖTTINGEN   (Germany)

^b MAX PLANCK INSTITUTE FOR CHEMICAL PHYSICS OF SOLIDS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

GERMANIUM; MAGNETIZATION; PHASE SPACE METHODS; SILICON; TEMPERATURE;

CHEMICAL PRESSURES; FIELD INDUCED; LOW-TEMPERATURE MAGNETIZATION; PRESSURE DERIVATIVES; QUANTUM CRITICAL POINTS; TEMPERATURE DEPENDENT; THERMODYNAMIC MEASUREMENTS; ZERO FIELDS;

THERMAL EXPANSION;

EID: 77957024861     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/200/1/012205     Document Type: Conference Paper

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