Void-filling and loss reduction in PECVD silica waveguide devices using boron-germanium codoped upper cladding

IEEE Photonics Technology Letters

Volumn 22, Issue 20, 2010, Pages 1491-1493

  Lin, Xufeng ^a   Ma, Xiao ^a   He, Jian Jun ^a  

^a ZHEJIANG UNIVERSITY   (China)

Author keywords

Arrayed waveguide grating (AWG); integrated optics; planar lightwave circuit (PLC); silica waveguide

Indexed keywords

BOROPHOSPHOSILICATE GLASS; CO-DOPED; COMMONLY USED; DOPING CONCENTRATION; GAS FLOWRATE; HIGH-TEMPERATURE ANNEALING; LOSS REDUCTION; NEW PROCESS; PLANAR LIGHT-WAVE CIRCUITS; SILICA WAVEGUIDE; TRANSMISSION LOSS; TRIPLEXERS;

BORON; BORON COMPOUNDS; DOPING (ADDITIVES); GERMANIUM; INTEGRATED OPTICS; OPTICAL MATERIALS; PHOSPHORUS COMPOUNDS; PHOTONICS; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA FILLED WAVEGUIDES; SCANNING ELECTRON MICROSCOPY; SILICA;

ARRAYED WAVEGUIDE GRATINGS;

EID: 77957005464     PISSN: 10411135     EISSN: None     Source Type: Journal    
DOI: 10.1109/LPT.2010.2064292     Document Type: Article

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