Fast wideband source tuning by extra-cavity parametric process

Optics Express

Volumn 18, Issue 19, 2010, Pages 19930-19940

  Kuo, Bill P P ^a   Radic, Stojan ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LASER TUNING;

LIMIT SETS; LIMITING PROCESS; MIXING PROCESS; OPTICAL SOURCE; PARAMETRIC PROCESS; PERFORMANCE LIMITS; TUNABLE LASER SOURCES; TUNABLE LASERS; TUNING SPEED; UNCERTAINTY PRINCIPLES; WIDEBAND SOURCE;

LASERS;

ARTICLE; COMPUTER AIDED DESIGN; COMPUTER SIMULATION; EQUIPMENT; EQUIPMENT DESIGN; LASER; THEORETICAL MODEL;

COMPUTER SIMULATION; COMPUTER-AIDED DESIGN; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; LASERS; MODELS, THEORETICAL;

EID: 77957003577     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.18.019930     Document Type: Article

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