Tantalum and niobium oxide capacitors: Leakage current, anodic oxidation and reliability

CARTS Europe 2007

Volumn , Issue , 2007, Pages 184-193

  Sikula, J ^a   Sedlakova, V ^a   Navarova, H ^a   Hlavka, J ^a   Tacano, M ^b   Sita, Z ^c  

^a BRNO UNIVERSITY OF TECHNOLOGY   (Czech Republic)

^b MEISEI UNIVERSITY   (Japan)

^c AVX Czech Republic   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

CONSTANT CURRENT DENSITY; DENSITY OF LOCALIZED STATE; ELECTROLYTE COMPOSITIONS; ELECTRON TRANSPORT PROCESS; IRREVERSIBLE PROCESS; NIOBIUM OXIDE CAPACITORS; POOLE-FRENKEL MECHANISMS; STABILITY AND RELIABILITIES;

CAPACITORS; ELECTRON TRANSPORT PROPERTIES; INSULATING MATERIALS; LEAKAGE CURRENTS; NIOBIUM OXIDE; RELIABILITY; STATISTICAL MECHANICS;

ANODIC OXIDATION;

EID: 77956953081     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (2)

1. L.L. Odinec, In: Anodnije okisnyje plenki, Petrozavodsk (1998)
2. C. Ahmed, Metals and Oxide Films, 1,320 (1973)