Dip coating of charged colloidal suspensions onto substrates with patterned wettability: Coating regime maps

Journal of Colloid and Interface Science

Volumn 352, Issue 1, 2010, Pages 202-210

  Reynolds, Timothy D ^a   Kalpathy, Sreeram K ^a   Kumar, Satish ^a   Francis, Lorraine F ^a  

^a University of Minnesota   (United States)

Author keywords

Dip coating; Pattern; Silica; Wettability

Indexed keywords

AQUEOUS DISPERSIONS; CATIONIC DISPERSION; CATIONIC SILICA; CHARGED COLLOIDAL SUSPENSIONS; COATING MORPHOLOGY; CRITICAL CONCENTRATION; CRITICAL SPEED; DIP COATING; NEGATIVE SURFACE CHARGES; NONUNIFORM; NONUNIFORMITY; PATTERN; PATTERN QUALITY; POSITIVE SURFACE CHARGE; PROCESS VARIABLES; REGIME MAP; SI SUBSTRATES; SILICA NANOPARTICLES; WETTABILITY; WITHDRAWAL RATE;

CHARGED PARTICLES; COATINGS; DYES; HYDROPHILICITY; HYDROPHOBICITY; MONOLAYERS; MORPHOLOGY; PHOTOLITHOGRAPHY; SILICA;

SUSPENSIONS (FLUIDS);

NANOCOATING; NANOPARTICLE; SILICON DIOXIDE;

ARTICLE; COLLOID; DISPERSION; MORPHOLOGY; PRIORITY JOURNAL; THICKNESS; WETTABILITY;

COATED MATERIALS, BIOCOMPATIBLE; COLLOIDS; NANOPARTICLES; PARTICLE SIZE; SILICON; SILICON DIOXIDE; SURFACE PROPERTIES; SUSPENSIONS; WETTABILITY;

EID: 77956942277     PISSN: 00219797     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcis.2010.08.028     Document Type: Article

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