Liquid phase deposition process to deposit TiO2 in the porous Mg2SiO4 ceramics

Journal of the Ceramic Society of Japan

Volumn 118, Issue 1380, 2010, Pages 731-734

  Kagomiya, Isao ^a   Sugihara, Joshi ^a   Kakimoto, Ken Ichi ^a   Ohsato, Hitoshi ^a  

^a NAGOYA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Liquid phase deposition method; Mg2SiO 4; Microwave dielectrics; TiO2

Indexed keywords

CERAMIC MATERIALS; DEPOSITION; DEPOSITS; DIELECTRIC DEVICES; DIELECTRIC MATERIALS; LIQUIDS; NATURAL FREQUENCIES; SINTERING; TEMPERATURE;

ELEVATED TEMPERATURE; LIQUID PHASE DEPOSITION METHOD; LIQUID PHASE DEPOSITION METHOD (LPD); LIQUID PHASE DEPOSITION PROCESS (LPD); LIQUID PHASE DEPOSITIONS (LPD); MICROWAVE DIELECTRICS; PRECURSOR SOLUTIONS; TEMPERATURE COEFFICIENT OF RESONANT FREQUENCY;

TITANIUM DIOXIDE;

EID: 77956929954     PISSN: 18820743     EISSN: 13486535     Source Type: Journal    
DOI: 10.2109/jcersj2.118.731     Document Type: Article

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