4D shearforce-based constant-distance mode scanning electrochemical microscopy

Analytical Chemistry

Volumn 82, Issue 18, 2010, Pages 7842-7848

  Nebel, Michaela ^a   Eckhard, Kathrin ^a   Erichsen, Thomas ^b   Schulte, Albert ^c   Schuhmann, Wolfgang ^a  

^a RUHR UNIVERSITY BOCHUM   (Germany)

^b Sensolytics GmbH   (Germany)

^c SURANAREE UNIVERSITY OF TECHNOLOGY   (Thailand)

Author keywords

[No Author keywords available]

Indexed keywords

AMPEROMETRIC; BAND ELECTRODE; CLOSEST DISTANCE; CONTINUOUS SCANNING; DIFFUSION ZONES; FEEDBACK MODE; FORCE DISTANCES; GRID POINTS; MODE SCANNING; POINT OF CLOSEST APPROACHES; REDOX-ACTIVE; SAMPLE SURFACE; SECM IMAGES;

MICROELECTRODES; PLATINUM; REDOX REACTIONS; SCANNING; SCANNING ELECTRON MICROSCOPY; SCANNING PROBE MICROSCOPY; ULTRASONIC DEVICES; VISUALIZATION;

ANALYTIC EQUIPMENT;

PLATINUM;

ARTICLE; CHEMISTRY; DIFFUSION; ELECTROCHEMISTRY; FEASIBILITY STUDY; INSTRUMENTATION; METHODOLOGY; MICROELECTRODE; MICROSCOPY; OXIDATION REDUCTION REACTION;

DIFFUSION; ELECTROCHEMISTRY; FEASIBILITY STUDIES; MICROELECTRODES; MICROSCOPY; OXIDATION-REDUCTION; PLATINUM;

EID: 77956610288     PISSN: 00032700     EISSN: None     Source Type: Journal    
DOI: 10.1021/ac1008805     Document Type: Article

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