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Volumn 174, Issue 1-3, 2010, Pages 71-73
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Determination of the band gap of TiO2-Al2O 3 films as a function of processing parameters
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Author keywords
Band gap; Indirect Transition Model
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Indexed keywords
ALUMINA;
ALUMINUM OXIDE;
DEPOSITION;
ELECTROPHORESIS;
TITANIUM DIOXIDE;
ULTRAVIOLET SPECTROSCOPY;
DOPED TITANIA;
ELECTROPHORETIC DEPOSITIONS;
INDIRECT TRANSITION;
INDIRECT TRANSITION MODEL;
PHOTOCATALYTIC ACTIVITIES;
PROCESSING PARAMETERS;
TITANIUM THIN FILMS;
TRANSITION MODEL;
UV SPECTRUM;
ENERGY GAP;
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EID: 77956489437
PISSN: 09215107
EISSN: None
Source Type: Journal
DOI: 10.1016/j.mseb.2010.05.001 Document Type: Conference Paper |
Times cited : (41)
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References (24)
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