Interferometric characterization of a subwavelength near-infrared negative index metamaterial

Optics Express

Volumn 18, Issue 17, 2010, Pages 17788-17795

  Zhang, Xuhuai ^a   Davanço, Marcelo ^a   Maller, Kara ^b   Jarvis, Thomas W ^b   Wu, Chihhui ^b   Fietz, Chris ^b   Korobkin, Dmitriy ^b   Li, Xiaoqin ^b   Shvets, Gennady ^b   Forrest, Stephen R ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

^b UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTERFEROMETRY; METAMATERIALS; PRODUCTION PLATFORMS;

AU FILM; BULK MATERIALS; INTERFEROMETRIC MEASUREMENT; LOSSLESS; MULTIPLE LAYERS; NEAR INFRARED; NEAR-IR; NEGATIVE INDEX; NEGATIVE INDEX METAMATERIAL; NEGATIVE PHASE; NUMERICAL SIMULATION; PROPAGATION DIRECTION; SINGLE LAYER; SUB-WAVELENGTH; UNIT CELLS;

GOLD;

GLASS;

ARTICLE; COMPUTER SIMULATION; CRYSTALLIZATION; EQUIPMENT DESIGN; INFRARED RADIATION; INSTRUMENTATION; INTERFEROMETRY; MATERIALS; METHODOLOGY; MICROWAVE RADIATION; OPTICS; THEORETICAL MODEL;

COMPUTER SIMULATION; CRYSTALLIZATION; EQUIPMENT DESIGN; GLASS; INFRARED RAYS; INTERFEROMETRY; MANUFACTURED MATERIALS; MICROWAVES; MODELS, THEORETICAL; OPTICS AND PHOTONICS;

EID: 77956376307     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.18.017788     Document Type: Article

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