Diffraction line-shapes, Fermi surface nesting, and quantum criticality in antiferromagnetic chromium at high pressure (invited)

Journal of Applied Physics

Volumn 107, Issue 9, 2010, Pages 405-

  Jaramillo, R ^a,c   Feng, Yejun ^b,c   Rosenbaum, T F ^c  

^a HARVARD UNIVERSITY   (United States)

^b ARGONNE NATIONAL LABORATORY   (United States)

^c THE UNIVERSITY OF CHICAGO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 77956376001     PISSN: 00218979     EISSN: 10897550     Source Type: Journal    
DOI: 10.1063/1.3364062     Document Type: Article

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