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Volumn 622, Issue 2, 2010, Pages 453-455

K0-INAA performance in the measurement of filters sampled in an industry with high loadings of metals

Author keywords

Compton Suppression System; Foundry industry; INAA; PIXE; Risk assessment

Indexed keywords

COMPTON SUPPRESSION; DETECTION LIMITS; FOUNDRY INDUSTRIES; FOUNDRY INDUSTRY; GERMANIUM CRYSTALS; HIGH CONCENTRATION; HIGH LOADINGS; INAA; INDUSTRIAL SECTOR; INSTRUMENTAL NEUTRON ACTIVATION ANALYSIS; OCCUPATIONAL HEALTH; OCCUPATIONAL HEALTH RISK; PARTICLE INDUCED X-RAY EMISSION; PARTICULATE MATTER; PHOTOPEAKS; PIXE;

EID: 77956341013     PISSN: 01689002     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nima.2010.02.054     Document Type: Conference Paper
Times cited : (7)

References (11)
  • 6
    • 77956341049 scopus 로고
    • Co-ordinated Research Program: CRP E4.10.08, IAEA, Belgium
    • W. Maenhaut, Co-ordinated Research Program: CRP E4.10.08, IAEA, Belgium, 1992.
    • (1992)
    • Maenhaut, W.1
  • 9
    • 0003419652 scopus 로고
    • 0-Standardization Method - A Move to the Optimization of Neutron Activation Analysis
    • Gent
    • 0-Standardization MethodA Move to the Optimization of Neutron Activation Analysis, Agreg Thesis, Gent, 1987.
    • (1987) Agregé Thesis
    • De Corte, F.1
  • 10
    • 77956343636 scopus 로고    scopus 로고
    • Portuguese Norm NP 1796, Instituto Português de Qualidade, Portugal
    • Portuguese Norm NP 1796, Occupational Exposure Limits to Chemical Agents, Instituto Português de Qualidade, Portugal, 2007.
    • (2007) Occupational Exposure Limits to Chemical Agents


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.