Young's modulus and density measurements of thin atomic layer deposited films using resonant nanomechanics

Journal of Applied Physics

Volumn 108, Issue 4, 2010, Pages

  Ilic, B ^a   Krylov, S ^b   Craighead, H G ^a  

^a Cornell University   (United States)

^b TEL AVIV UNIVERSITY   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA FILMS; ALUMINUM NITRIDE FILMS; ATOMIC LAYER DEPOSITED; BEFORE AND AFTER; CLAMPING CONDITIONS; CONFORMAL COATINGS; DENSITY MEASUREMENTS; DEPOSITED FILMS; EFFECTIVE BENDING STIFFNESS; EFFECTIVE MASS; ELECTRONIC CIRCUITS; EULER BERNOULLI BEAMS; FINITE ELEMENT ANALYSIS; FINITE ELEMENT SIMULATIONS; FREQUENCY MEASUREMENTS; HIGH-K DIELECTRIC; IN-PLANE; INTERFEROMETRIC DETECTION; MATERIAL PROPERTY; NANO-MECHANICAL CANTILEVER; NANOMECHANICAL OSCILLATORS; NANOMECHANICAL STRUCTURE; NONIDEAL; OPTICAL EXCITATIONS; OUT-OF-PLANE; PER UNIT LENGTH; POISSON'S RATIO; RESONANT FREQUENCIES; SACRIFICIAL LAYER; SIMPLE EXPRESSION; SINGLE CRYSTAL SILICON; SINGLE CRYSTAL SILICON CANTILEVERS; SPECTRAL RESPONSE; SUSPENDED STRUCTURE; THREE DIMENSIONAL FINITE ELEMENT ANALYSIS; TWO EQUATION; VIBRATIONAL RESPONSE; YOUNG'S MODULUS;

ALUMINUM; ALUMINUM COATINGS; ALUMINUM NITRIDE; DEPOSITION; ELASTIC MODULI; ELASTICITY; EXTRACTION; MATERIALS PROPERTIES; NANOCANTILEVERS; NATURAL FREQUENCIES; NITRIDES; PHOTOEXCITATION; POISSON RATIO; SILICON WAFERS; SINGLE CRYSTALS; STIFFNESS; THREE DIMENSIONAL; ULTRATHIN FILMS; VIBRATION ANALYSIS; WEAR RESISTANCE;

FINITE ELEMENT METHOD;

EID: 77956309587     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3474987     Document Type: Conference Paper

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