Influence of oxygen and free radicals promoters on the UV-254nm photolysis of diclofenac

Chemical Engineering Journal

Volumn 163, Issue 1-2, 2010, Pages 35-40

  Rivas, Javier ^a   Gimeno, Olga ^a   Borralho, Teresa ^a   Beltrán, Fernando ^a  

^a UNIVERSITY OF EXTREMADURA   (Spain)

Author keywords

Diclofenac; Peroxides; Photolysis; Quantum yield

Indexed keywords

DICLOFENAC; EXPERIMENTAL CONDITIONS; FIRST ORDER KINETICS; INFLUENCE OF OXYGEN; INITIAL CONCENTRATION; OPERATING CONDITION; OPERATING VARIABLES; PROCESS EFFICIENCY; REMOVAL EFFICIENCIES;

FREE RADICAL REACTIONS; OXIDATION; OXYGEN; PEROXIDES; PHOTOLYSIS; QUANTUM YIELD; REMOVAL;

FREE RADICALS;

EID: 77956296544     PISSN: 13858947     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cej.2010.07.027     Document Type: Article

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