Strain-enhanced photoluminescence from Ge direct transition

Applied Physics Letters

Volumn 96, Issue 21, 2010, Pages

  Cheng, T H ^a   Peng, K L ^a   Ko, C Y ^a   Chen, C Y ^a   Lan, H S ^a   Wu, Y R ^a   Liu, C W ^a,b   Tseng, H H ^c  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

^c Texas State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BAND GAP REDUCTION; BIAXIAL TENSILE STRAIN; DEFORMATION POTENTIAL; DIRECT TRANSITION; ELECTRON POPULATION; IN-BAND; PHOTOLUMINESCENCE SPECTRUM; STRONG ENHANCEMENT;

ELECTRON MOBILITY; ENERGY GAP; GERMANIUM; LANDFORMS; PHOTOLUMINESCENCE;

TENSILE STRAIN;

EID: 77956244835     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3429085     Document Type: Article

References (18)

1. M. A. Green, J. Zhao, A. Wang, P. J. Reece, and M. Gal, Nature (London) NATUAS 0028-0836 412, 805 (2001). 10.1038/35090539 (Pubitemid 32801459)
2. C. W. Liu, M. H. Lee, M.-J. Chen, I. C. Chen, and C.-F. Lin, Appl. Phys. Lett. APPLAB 0003-6951 76, 1516 (2000). 10.1063/1.126081
3. H. Presting, T. Zinke, A. Splett, H. Kibbel, and M. Jaros, Appl. Phys. Lett. APPLAB 0003-6951 69, 2376 (1996). 10.1063/1.117642
4. J. C. Sturm, H. Manoharan, L. C. Lenchyshyn, M. L. Thewalt, N. L. Rowell, J.-P. Nol, and D. C. Houghton, Phys. Rev. Lett. PRLTAO 0031-9007 66, 1362 (1991). 10.1103/PhysRevLett.66.1362
5. C. Li, Y. Chen, Z. Zhou, H. Lai, and S. Chen, Appl. Phys. Lett. APPLAB 0003-6951 95, 251102 (2009). 10.1063/1.3275863
6. X. Sun, J. Liu, L. C. Kimerling, and J. Michel, Appl. Phys. Lett. APPLAB 0003-6951 95, 011911 (2009). 10.1063/1.3170870
7. J. Liu, X. Sun, D. Pan, X. Wang, L. C. Kimerling, T. L. Koch, and J. Michel, Opt. Express OPEXFF 1094-4087 15, 11272 (2007). 10.1364/OE.15.011272 (Pubitemid 47360563)
8. S.-L. Cheng, J. Lu, G. Shambat, H.-Y. Yu, K. Saraswat, J. Vuckovic, and Y. Nishi, Opt. Express OPEXFF 1094-4087 17, 10019 (2009). 10.1364/OE.17.010019
9. T.-H. Cheng, C.-Y. Ko, C.-Y. Chen, K.-L. Peng, G.-L. Luo, C. W. Liu, and H.-H. Tseng, Appl. Phys. Lett. APPLAB 0003-6951 96, 091105 (2010). 10.1063/1.3352048
10. M. H. Liao, M.-J. Chen, T. C. Chen, P.-L. Wang, and C. W. Liu, Appl. Phys. Lett. APPLAB 0003-6951 86, 223502 (2005). 10.1063/1.1937989 (Pubitemid 40861630)
11. M. El Kurdi, T. Kociniewski, T.-P. Ngo, J. Boulmer, D. D́barre, P. Boucaud, J. F. Damlencourt, O. Kermarrec, and D. Bensahel, Appl. Phys. Lett. APPLAB 0003-6951 94, 191107 (2009). 10.1063/1.3138155
12. C. G. Van de Walle, Phys. Rev. B PRBMDO 0163-1829 39, 1871 (1989). 10.1103/PhysRevB.39.1871
13. M. V. Fischetti and S. E. Laux, J. Appl. Phys. JAPIAU 0021-8979 80, 2234 (1996). 10.1063/1.363052
14. M. H. Liao, T.-H. Cheng, and C. W. Liu, Appl. Phys. Lett. APPLAB 0003-6951 89, 261913 (2006). 10.1063/1.2420783 (Pubitemid 46058007)
15. J. I. Pankove, Phys. Rev. PRVAAH 0096-8250 140, A2059 (1965). 10.1103/PhysRev.140.A2059
16. P. H. Lim, S. Park, Y. Ishikawa, and K. Wada, Opt. Express OPEXFF 1094-4087 17, 16358 (2009). 10.1364/OE.17.016358
17. C. Y.-P. Chao and S. L. Chuang, Phys. Rev. B PRBMDO 0163-1829 46, 4110 (1992). 10.1103/PhysRevB.46.4110
18. J. Liu, D. D. Cannon, K. Wada, Y. Ishikawa, D. T. Danielson, S. Jongthammanurak, J. Michel, and L. C. Kimerling, Phys. Rev. B PRBMDO 0163-1829 70, 155309 (2004). 10.1103/PhysRevB.70.155309 (Pubitemid 40040426)