Cyclodextrin inclusion complex formation with butylated hydroxytoluene and its application in polyethylene film

Journal of Applied Polymer Science

Volumn 118, Issue 2, 2010, Pages 1184-1190

  Agrawal, Manisha ^a   Kim, Young Teck ^b   Tonelli, Alan ^a   Whang, Hyun Suk ^a  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

^b CLEMSON UNIVERSITY   (United States)

Author keywords

Antioxidant; Butylated hydroxytoluene; Cyclodextrin inclusion complex; Polyethylene film

Indexed keywords

ANTIOXIDANT; BUTYLATED HYDROXYTOLUENE; HIGH-TEMPERATURE PROCESSING; INCLUSION COMPLEX; INCLUSION COMPLEXATION; LDPE FILM; LOSS MODULI; MATRIX; OXIDATION INDUCTION TIME; OXIDATIVE DEGRADATION; PHENOLIC ANTIOXIDANT; PILOT PLANT SCALE; POLYETHYLENE FILM; POLYMER PROCESSING; STORAGE MODULI; THERMAL DEGRADATIONS; VISCOELASTIC BEHAVIORS; VOLATILE COMPOUNDS; WIDE-ANGLE X-RAY DIFFRACTION;

DEGRADATION; DIFFERENTIAL SCANNING CALORIMETRY; DYNAMIC ANALYSIS; DYNAMIC MECHANICAL ANALYSIS; INCLUSIONS; NUCLEAR MAGNETIC RESONANCE; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; OXIDATION; PHENOLS; PILOT PLANTS; POLYETHYLENES; POLYMERS; RESONANCE; THERMOGRAVIMETRIC ANALYSIS; THERMOPLASTICS; VOLATILE ORGANIC COMPOUNDS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

DATA STORAGE EQUIPMENT;

EID: 77956238520     PISSN: 00218995     EISSN: 10974628     Source Type: Journal    
DOI: 10.1002/app.32543     Document Type: Article

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