Effect of Tin+ defects on electrochemical properties of highly-ordered titania nanotube arrays

Thin Solid Films

Volumn 518, Issue 23, 2010, Pages 7152-7155

  Xiao, Peng ^a   Fang, Honglin ^a   Cao, Guozhong ^b   Zhang, Yunhuai ^a   Zhang, Xiaoxing ^a  

^a CHONGQING UNIVERSITY   (China)

^b UNIVERSITY OF WASHINGTON   (United States)

Author keywords

Annealing; Electrochemical properties; Surface defects; Titania nanotubes; X ray photoelectron spectroscopy

Indexed keywords

ANNEALING TREATMENTS; ANODIZATIONS; ELECTRODE POTENTIALS; ELECTRON TRANSFER RATES; OXYGEN EVOLUTION REACTION; PHOTOCURRENT RESPONSE; SEM; STEADY STATE POLARIZATION; TIO; TITANIA NANOTUBE ARRAYS; TITANIA NANOTUBES; XPS;

ANNEALING; CYCLIC VOLTAMMETRY; ELECTROCHEMICAL PROPERTIES; ELECTRONS; NANOTUBES; OXYGEN; OXYGEN VACANCIES; PHOTOCURRENTS; PHOTONS; POLARIZATION; SCANNING ELECTRON MICROSCOPY; SURFACE DEFECTS; SURFACE PROPERTIES; TITANIUM DIOXIDE; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; X RAYS;

ELECTROCHEMICAL ELECTRODES;

EID: 77956230633     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.07.056     Document Type: Article

References (18)

1. K. Honda, and A. Fujishima Nature 238 1972 37
2. S. Sreekantan, R. Hazan, and Z. Lockman Thin Solid Films 518 2009 16
3. J. Kong, S. Shi, L. Kong, X. Zhu, and J. Ni Electrochim. Acta 53 2007 2048
4. K.Y. Chun, B.W. Park, Y.M. Sung, D.J. Kwak, Y.T. Hyun, and M.W. Park Thin Solid Films 517 2009 4196
5. K.W. Kim, E.H. Lee, J.S. Kim, K.H. Shin, and B.I. Jung J. Electrochem. Soc. 149 2002 D187
6. M. Radecka, A. Trenczek-Zajac, K. Zakrzewska, and M. Rekas J. Power Sources 173 2007 816
7. J.F. Houlihan, D.B. Armitage, T. Hoovler, D. Bonaquist, D.P. Madacsi, and L.N. Mulay Mater. Res. Bull. 13 1978 1205
8. T. Berger, T. Lana-Villarreal, D. Monllor-Satoca, and R. Gómez Electrochem. Commun. 8 2006 1713
9. E. Topoglidis, A.E.G. Cass, G. Gilardi, S. Sadeghi, N. Beaumont, and J.R. Durrant Anal. Chem. 70 1998 5111
10. D.V. Bavykin, E.V. Milsom, F. Marken, D.H. Kim, D.H. Marsh, D.J. Riley, F.C. Walsh, K.H. El-Abiary, and A.A. Lapkin Electrochem. Commun. 7 2005 1050
11. F. Amano, T. Yasumoto, T. Shibayama, S. Uchida, and B. Ohtani Appl. Catal., B 89 2009 583
12. Y. Zhang, P. Xiao, X. Zhou, D. Liu, B.B. Garciaa, and G. Cao J. Mater. Chem. 19 2009 948
13. P. Xiao, B.B. Garcia, Q. Guo, D. Liu, and G. Cao Electrochem. Commun. 9 2007 2441
14. G.K. Mor, K. Shankar, M. Paulose, O.K. Varghese, and C.A. Grimes Nano Lett. 5 2005 191
15. Q. Cai, M. Paulose, O.K. Varghese, and C.A. Grimes J. Mater. Res. 20 2005 230
16. O.K. Varghese, D. Gong, M. Paulose, C.A. Grimes, and E.C. Dickey J. Mater. Res. 18 2003 156
17. C.G. Hu, W.L. Wang, and S.X. Wang Diamond Relat. Mater. 12 2003 1295
18. Y. Maeda, K. Sato, R. Ramaraj, T.N. Rao, D.A. Tryk, and A. Fujishima Electrochim. Acta 44 1999 3441