-
1
-
-
34249332414
-
-
IJDTAL 1551-319X. 10.1109/JDT.2007.895339
-
M. R. Krames, O. B. Shchekin, R. Mueller-Mach, G. O. Mueller, L. Zhou, G. Harbers, and M. G. Craford, J. Disp. Technol. IJDTAL 1551-319X 3, 160 (2007). 10.1109/JDT.2007.895339
-
(2007)
J. Disp. Technol.
, vol.3
, pp. 160
-
-
Krames, M.R.1
Shchekin, O.B.2
Mueller-Mach, R.3
Mueller, G.O.4
Zhou, L.5
Harbers, G.6
Craford, M.G.7
-
2
-
-
35148864428
-
-
APPLAB 0003-6951. 10.1063/1.2785135
-
Y. C. Shen, G. O. Mueller, S. Watanabe, N. F. Gardner, A. Munkholm, and M. R. Krames, Appl. Phys. Lett. APPLAB 0003-6951 91, 141101 (2007). 10.1063/1.2785135
-
(2007)
Appl. Phys. Lett.
, vol.91
, pp. 141101
-
-
Shen, Y.C.1
Mueller, G.O.2
Watanabe, S.3
Gardner, N.F.4
Munkholm, A.5
Krames, M.R.6
-
3
-
-
37149027248
-
-
APPLAB 0003-6951. 10.1063/1.2807272
-
N. F. Gardner, G. O. Müller, Y. C. Shen, G. Chen, and S. Watanabe, Appl. Phys. Lett. APPLAB 0003-6951 91, 243506 (2007). 10.1063/1.2807272
-
(2007)
Appl. Phys. Lett.
, vol.91
, pp. 243506
-
-
Gardner, N.F.1
Müller, G.O.2
Shen, Y.C.3
Chen, G.4
Watanabe, S.5
-
5
-
-
69549108530
-
-
APPLAB 0003-6951. 10.1063/1.3216578
-
H. Ryu, H. Kim, and J. Shim, Appl. Phys. Lett. APPLAB 0003-6951 95, 081114 (2009). 10.1063/1.3216578
-
(2009)
Appl. Phys. Lett.
, vol.95
, pp. 081114
-
-
Ryu, H.1
Kim, H.2
Shim, J.3
-
7
-
-
46649103454
-
-
APPLAB 0003-6951. 10.1063/1.2953543
-
J. Hader, J. V. Moloney, B. Pasenow, S. W. Koch, M. Sabathil, N. Linder, and S. Lutgen, Appl. Phys. Lett. APPLAB 0003-6951 92, 261103 (2008). 10.1063/1.2953543
-
(2008)
Appl. Phys. Lett.
, vol.92
, pp. 261103
-
-
Hader, J.1
Moloney, J.V.2
Pasenow, B.3
Koch, S.W.4
Sabathil, M.5
Linder, N.6
Lutgen, S.7
-
8
-
-
35648977539
-
-
APPLAB 0003-6951. 10.1063/1.2800290
-
M. H. Kim, M. F. Schubert, Q. Dai, J. K. Kim, E. F. Schubert, J. Piprek, and Y. Park, Appl. Phys. Lett. APPLAB 0003-6951 91, 183507 (2007). 10.1063/1.2800290
-
(2007)
Appl. Phys. Lett.
, vol.91
, pp. 183507
-
-
Kim, M.H.1
Schubert, M.F.2
Dai, Q.3
Kim, J.K.4
Schubert, E.F.5
Piprek, J.6
Park, Y.7
-
9
-
-
52949131872
-
-
APPLAB 0003-6951. 10.1063/1.2988324
-
J. Xie, X. Ni, Q. Fan, R. Shimada, Ü. Özgür, and H. Morko̧, Appl. Phys. Lett. APPLAB 0003-6951 93, 121107 (2008). 10.1063/1.2988324
-
(2008)
Appl. Phys. Lett.
, vol.93
, pp. 121107
-
-
Xie, J.1
Ni, X.2
Fan, Q.3
Shimada, R.4
Özgür, Ü.5
Morko̧, H.6
-
10
-
-
70450270820
-
-
APPLAB 0003-6951. 10.1063/1.3266833
-
J. Lee, X. Li, X. Ni, Ü. Özgür, H. Morko̧, T. Paskova, G. Mulholland, and K. R. Evans, Appl. Phys. Lett. APPLAB 0003-6951 95, 201113 (2009). 10.1063/1.3266833
-
(2009)
Appl. Phys. Lett.
, vol.95
, pp. 201113
-
-
Lee, J.1
Li, X.2
Ni, X.3
Özgür, Ü.4
Morko̧, H.5
Paskova, T.6
Mulholland, G.7
Evans, K.R.8
-
11
-
-
77953687660
-
-
IEEPAD 0018-9219. 10.1109/JPROC.2010.2043210
-
Ü. Özgür, H. Liu, X. Li, X. Ni, and H. Morko̧, Proc. IEEE IEEPAD 0018-9219 98, 1180 (2010). 10.1109/JPROC.2010.2043210
-
(2010)
Proc. IEEE
, vol.98
, pp. 1180
-
-
Özgür, Ü.1
Liu, H.2
Li, X.3
Ni, X.4
Morko̧, H.5
-
12
-
-
77956208475
-
-
ZZZZZZ 1862-6254. 10.1002/pssr.201004147
-
X. Ni, X. Li, J. Lee, S. Liu, Ü. Özgür, H. Morko̧, A. Matulionis, T. Paskova, G. Mulholland, and K. R. Evans, Phys. Status Solidi (RRL) ZZZZZZ 1862-6254 4, 194 (2010). 10.1002/pssr.201004147
-
(2010)
Phys. Status Solidi (RRL)
, vol.4
, pp. 194
-
-
Ni, X.1
Li, X.2
Lee, J.3
Liu, S.4
Özgür, Ü.5
Morko̧, H.6
Matulionis, A.7
Paskova, T.8
Mulholland, G.9
Evans, K.R.10
-
13
-
-
0000796986
-
-
APPLAB 0003-6951. 10.1063/1.116673
-
K. T. Tsen, R. P. Joshi, D. K. Ferry, A. Botchkarev, B. Sverdlov, A. Salvador, and H. Morko̧, Appl. Phys. Lett. APPLAB 0003-6951 68, 2990 (1996). 10.1063/1.116673
-
(1996)
Appl. Phys. Lett.
, vol.68
, pp. 2990
-
-
Tsen, K.T.1
Joshi, R.P.2
Ferry, D.K.3
Botchkarev, A.4
Sverdlov, B.5
Salvador, A.6
Morko̧, H.7
-
14
-
-
63049116730
-
-
APPLAB 0003-6951. 10.1063/1.3100773
-
Q. Dai, M. F. Schubert, M. H. Kim, J. K. Kim, E. F. Schubert, D. D. Koleske, M. H. Crawford, S. R. Lee, A. J. Fischer, G. Thaler, and M. A. Banas, Appl. Phys. Lett. APPLAB 0003-6951 94, 111109 (2009). 10.1063/1.3100773
-
(2009)
Appl. Phys. Lett.
, vol.94
, pp. 111109
-
-
Dai, Q.1
Schubert, M.F.2
Kim, M.H.3
Kim, J.K.4
Schubert, E.F.5
Koleske, D.D.6
Crawford, M.H.7
Lee, S.R.8
Fischer, A.J.9
Thaler, G.10
Banas, M.A.11
-
15
-
-
70449725910
-
-
edited by H. -Y. Cha (Transworld Research Network, Kerala, India)
-
J. Liberis, I. Matulionien, A. Matulionis, M. Ramonas, and L. F. Eastman, in Advanced Semiconductor Materials and Devices Research: III-Nitrides and SiC, edited by, H. -Y. Cha, (Transworld Research Network, Kerala, India, 2009).
-
(2009)
Advanced Semiconductor Materials and Devices Research: III-Nitrides and SiC
-
-
Liberis, J.1
Matulionien, I.2
Matulionis, A.3
Ramonas, M.4
Eastman, L.F.5
|