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Applied Physics Letters

Volumn 97, Issue 8, 2010, Pages

Growth of superconducting Sr2 RuO4 thin films

(6) Krockenberger, Y a,d Uchida, M b Takahashi, K S a Nakamura, M a Kawasaki, M a,c Tokura, Y a,b

a RIKEN (Japan)

b UNIVERSITY OF TOKYO (Japan)

c TOHOKU UNIVERSITY (Japan)

d RNTT Basic Research Laboratories (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL THIN FILMS; GROWTH CONDITIONS; HIGH CRYSTALLINITY; JOSEPHSON JUNCTIONS; LAYER-BY-LAYER GROWTH; LOW-TRANSITION TEMPERATURE; ORDER PARAMETER; PULSED-LASER DEPOSITION TECHNIQUE; RESIDUAL RESISTIVITY RATIOS; SUPERCONDUCTING TRANSITIONS; ZERO RESISTIVITY;

PULSED LASER DEPOSITION; PULSED LASERS; QUANTUM OPTICS; RUTHENIUM ALLOYS; RUTHENIUM COMPOUNDS; SUPERCONDUCTING FILMS; SUPERCONDUCTING TRANSITION TEMPERATURE; SUPERCONDUCTIVITY; TANTALUM;

EPITAXIAL FILMS;

EID: 77956195171 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3481363 Document Type: Article

Times cited : (83)

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