Compact modeling and robust layout optimization for contacts in deep sub-wavelength lithography

Proceedings - Design Automation Conference

Volumn , Issue , 2010, Pages 408-411

  Ban, Yongchan ^a   Pan, David Z ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

Contact; DFM; Lithography; Optimization; Variation; VLSI

Indexed keywords

32-NM NODE; COMPACT MODELING; CONTACT; CONTACT AREAS; CONTACT POSITION; DELAY IMPROVEMENTS; DELAY VARIATION; DFM; LAYOUT OPTIMIZATION; PROCESS CONDITION; SATURATION CURRENT; STANDARD CELL; SUB-WAVELENGTH; VARIATION; VLSI;

COMPUTER AIDED DESIGN; CONTACT RESISTANCE; ELECTRIC BATTERIES; IMPACT RESISTANCE; LITHOGRAPHY;

OPTIMIZATION;

EID: 77956194645     PISSN: 0738100X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1145/1837274.1837375     Document Type: Conference Paper

References (10)

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