Flexible pentacene organic thin film transistor circuits fabricated directly onto elastic silicone membranes

Applied Physics Letters

Volumn 95, Issue 24, 2009, Pages

  Graz, Ingrid M ^a   Lacour, Stéphanie P ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVE LOAD; CRACK FREE; ELECTRICAL FAILURES; ELECTRICAL PROPERTY; GOLD ELECTRODES; INVERTER CIRCUIT; ON/OFF CURRENT RATIO; ORGANIC THIN FILM TRANSISTORS; PARYLENE C; PENTACENE FILM; PENTACENE THIN FILM TRANSISTORS; PENTACENES; POLYDIMETHYLSILOXANE MEMBRANE; ROOM TEMPERATURE; SATURATION MOBILITY; SILICONE MEMBRANE; VAPOR PHASE;

ELECTRIC PROPERTIES; GATE DIELECTRICS; GATES (TRANSISTOR); GOLD COATINGS; MICROCHANNELS; THIN FILM CIRCUITS; THIN FILM TRANSISTORS; THIN FILMS;

SILICONES;

EID: 77956150727     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3265737     Document Type: Article

References (16)

1. S. P. Lacour and S. Wagner, Tech. Dig.-Int. Electron Devices Meet. TDIMD5 0163-1918 2005, 101.
2. A. P. Micolich, L. L. Bell, and A. R. Hamilton, J. Appl. Phys. JAPIAU 0021-8979 102, 084511 (2007). 10.1063/1.2802284
3. T. Someya, Y. Kato, T. Sekitani, S. Iba, Y. Noguchi, Y. Murase, H. Kawaguchi, and T. Sakurai, Proc. Natl. Acad. Sci. U.S.A. PNASA6 0027-8424 102, 12321 (2005). 10.1073/pnas.0502392102
4. M.-M. Ling, Z. Bao, and D. Li, Appl. Phys. Lett. APPLAB 0003-6951 88, 033502 (2006). 10.1063/1.2166488
5. E. Orgiu, I. Manunza, M. Sana, P. Cosseddu, and A. Bonfiglio, Thin Solid Films THSFAP 0040-6090 516, 1533 (2008). 10.1016/j.tsf.2007.03.157
6. D. Knipp, R. A. Street, A. Völkel, and J. Ho, J. Appl. Phys. JAPIAU 0021-8979 93, 347 (2003). 10.1063/1.1525068
7. T. Yasuda, K. Fujita, H. Nakashima, and T. Tsutsui, Jpn. J. Appl. Phys., Part 2 JAPLD8 0021-4922 42, L967 (2003). 10.1143/JJAP.42.L967
8. C. R. Newman, R. J. Chesterfield, M. J. Panzer, and C. D. Frisbie, J. Appl. Phys. JAPIAU 0021-8979 98, 084506 (2005). 10.1063/1.2076429
9. J. Genzer and J. Groenewold, Soft Matter SMOABF 1744-683X 2, 310 (2006). 10.1039/b516741h
10. S. Haas, B. Batlogg, C. Besnard, M. Schiltz, C. Kloc, and T. Siegrist, Phys. Rev. B PRBMDO 0163-1829 76, 205203 (2007). 10.1103/PhysRevB.76.205203
11. K. Tsukagoshia, I. Yagi, K. Shigeto, and K. Yanagisawa, Appl. Phys. Lett. APPLAB 0003-6951 87, 183502 (2005). 10.1063/1.2120894
12. L. Zhou, A. Wanga, S.-C. Wu, J. Sun, S. Park, and T. N. Jackson, Appl. Phys. Lett. APPLAB 0003-6951 88, 083502 (2006). 10.1063/1.2178213
13. C. Yang, J. Yoon, S. H. Kim, K. Hong, D. S. Chung, K. Heo, C. E. Park, and M. Ree, Appl. Phys. Lett. APPLAB 0003-6951 92, 243305 (2008). 10.1063/1.2948862
14. D. Simeone, S. Cipolloni, L. Mariucci, M. Rapisarda, A. Minotti, A. Pecora, M. Cuscuǹ, L. Maiolo, and G. Fortunato, Thin Solid Films THSFAP 0040-6090 517, 6283 (2009). 10.1016/j.tsf.2009.02.088
15. H. Klauk, D. J. Gundlach, and Thomas N. Jackson, IEEE Electron Device Lett. EDLEDZ 0741-3106 20, 289 (1999). 10.1109/55.767101
16. H. Klauk, M. Halik, U. Zschieschang, F. Eder, G. Schmid, and C. Dehm, Appl. Phys. Lett. APPLAB 0003-6951 82, 4175 (2003). 10.1063/1.1579870