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Journal of Chemical Physics

Volumn 133, Issue 7, 2010, Pages

Phase-sensitive neutron reflectometry measurements applied in the study of photovoltaic films

(5) Kiel, J W a,b MacKay, M E b Kirby, B J c Maranville, B B c Majkrzak, C F c

a Michigan State University (United States)

b UNIVERSITY OF DELAWARE (United States)

c NATIONAL INSTITUTE OF STANDARDS (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVE LAYER; AIR INTERFACE; BUTYRIC ACIDS; DEVICE MATERIALS; DEVICE PERFORMANCE; HIGH CONCENTRATION; METHYL ESTERS; NANOSCALE MORPHOLOGY; NEUTRON REFLECTIVITY; NEUTRON REFLECTOMETRY; PHASE-SENSITIVE; POLY (3-HEXYLTHIOPHENE); POLYMER-BASED SOLAR CELLS; SCATTERING LENGTH DENSITY;

ESTERS; FATTY ACIDS; REFLECTION; SOLAR CELLS;

CARRIER MOBILITY;

EID: 77956078198 PISSN: 00219606 EISSN: None Source Type: Journal
DOI: 10.1063/1.3471583 Document Type: Article

Times cited : (48)

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