Phase and optical characterizations of annealed SnO thin films and their p-Type TFT application

Journal of the Electrochemical Society

Volumn 157, Issue 6, 2010, Pages

  Liang, Ling Yan ^a   Liu, Zhi Min ^a   Cao, Hong Tao ^a   Yu, Zheng ^a   Shi, Yuan Yuan ^a   Chen, Ai Hua ^a   Zhang, Hai Zhong ^a   Fang, Yan Qun ^a   Sun, Xi Lian ^a  

^a NINGBO INSTITUTE OF MATERIALS TECHNOLOGY AND ENGINEERING   (China)

Author keywords

[No Author keywords available]

Indexed keywords

BAND GAPS; CRYSTALLIZATION PROCESS; ELECTRON BEAM EVAPORATION; FIELD-EFFECT MOBILITIES; OPTICAL CHARACTERIZATION; ORDER OF MAGNITUDE; ORTHORHOMBIC STRUCTURES; P-TYPE; POLARIZABILITIES; POLYCRYSTALLINE; SI (001) SUBSTRATE;

AMORPHOUS FILMS; CRYSTAL ATOMIC STRUCTURE; ELECTRON BEAMS; FIELD EFFECT TRANSISTORS; LEAD OXIDE; QUARTZ; RAPID THERMAL ANNEALING; RAPID THERMAL PROCESSING; REFRACTIVE INDEX; SILICON; SILICON COMPOUNDS; SPECTROSCOPIC ELLIPSOMETRY; THIN FILMS; TIN; VAPOR DEPOSITION; X RAY DIFFRACTION;

THIN FILM TRANSISTORS;

EID: 77956052615     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3385390     Document Type: Article

References (51)

1. A. Odani, A. Nimberger, B. Markovsky, E. Sominski, E. Levi, V. G. Kumar, A. Motiei, A. Gedanken, P. Dan, and D. Aurbach, J. Power Sources JPSODZ 0378-7753, 119-121, 517 (2003). 10.1016/S0378-7753(03)00276-3
2. P. X. Song and D. S. Wen, J. Phys. Chem. C JPCCCK 1932-7447, 113, 13470 (2009). 10.1021/jp902580s
3. J. Calderer, P. Molinas, J. Sueiras, E. Llobet, X. Vilanova, X. Correig, F. Masana, and A. Rodriguez, Microelectron. Reliab. MCRLAS 0026-2714, 40, 807 (2000). 10.1016/S0026-2714(99)00306-6
4. Z. H. Han, N. Guo, F. Q. Li, W. Q. Zhang, H. Q. Zhao, and Y. T. Qian, Mater. Lett. MLETDJ 0167-577X, 48, 99 (2001). 10.1016/S0167-577X(00)00286-X (Pubitemid 32265207)
5. X. Q. Pan and L. Fu, J. Appl. Phys. JAPIAU 0021-8979, 89, 6048 (2001). 10.1063/1.1368865
6. J. Geurts, S. Rau, W. Richter, and F. J. Schmitte, Thin Solid Films THSFAP 0040-6090, 121, 217 (1984). 10.1016/0040-6090(84)90303-1 (Pubitemid 15492852)
7. Y. Ogo, H. Hiramatsu, K. Nomura, H. Yanagi, T. Kamiya, M. Hirano, and H. Hosono, Appl. Phys. Lett. APPLAB 0003-6951, 93, 032113 (2008). 10.1063/1.2964197
8. Y. Ogo, H. Hiramatsu, K. Nomura, H. Yanagi, T. Kamiya, M. Kimura, M. Hirano, and H. Hosono, Phys. Status Solidi A PSSABA 0031-8965, 206, 2187 (2009). 10.1002/pssa.200881792
9. A. Seko, A. Togo, F. Oba, and I. Tanaka, Phys. Rev. Lett. PRLTAO 0031-9007, 100, 045702 (2008). 10.1103/PhysRevLett.100.045702 (Pubitemid 351191346)
10. A. Togo, F. Oba, I. Tanaka, and K. Tatsumi, Phys. Rev. B PRBMDO 0163-1829, 74, 195128 (2006). 10.1103/PhysRevB.74.195128 (Pubitemid 44838404)
11. D. Adler and J. Feinleib, Phys. Rev. B PRBMDO 0163-1829, 2, 3112 (1970). 10.1103/PhysRevB.2.3112
12. A. Tsukazaki, A. Ohtomo, T. Onuma, M. Ohtani, T. Makino, M. Sumiya, K. Ohtani, S. F. Chichibu, S. Fuke, Y. Segawa, Nature Mater. NMAACR 1476-1122, 4, 42 (2005). 10.1038/nmat1284 (Pubitemid 40021000)
13. Z. Ji, L. Zhao, Z. P. He, Q. Zhou, and C. Chen, Mater. Lett. MLETDJ 0167-577X, 60, 1387 (2006). 10.1016/j.matlet.2005.11.057 (Pubitemid 43267330)
14. J. Ni, X. Zhao, X. Zheng, J. Zhao, and B. Liu, Acta Mater. ACMAFD 1359-6454, 57, 278 (2009). 10.1016/j.actamat.2008.09.013
15. M. Taguchi, M. Matsunami, Y. Ishida, R. Eguchi, A. Chainani, Y. Takata, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa, Y. Senba, H. Ohashi, and S. Shin, Phys. Rev. Lett. PRLTAO 0031-9007, 100, 206401 (2008). 10.1103/PhysRevLett.100.206401 (Pubitemid 351718022)
16. P. Schröer, P. Krüger, and J. Pollmann, Phys. Rev. B PRBMDO 0163-1829, 47, 6971 (1993). 10.1103/PhysRevB.47.6971
17. J. E. Jaffe, R. Pandey, and A. B. Kunz, Phys. Rev. B PRBMDO 0163-1829, 43, 14030 (1991). 10.1103/PhysRevB.43.14030
18. X. Q. Pan and L. Fu, J. Electroceram. JOELFJ 1385-3449, 7, 35 (2001). 10.1023/A:1012270927642 (Pubitemid 33074815)
19. W. Guo, L. Fu, Y. Zhang, K. Zhang, G. Graham, L. Y. Liang, Z. M. Liu, H. T. Cao, and X. Q. Pan, Appl. Phys. Lett. APPLAB 0003-6951, 96, 042113 (2010). 10.1063/1.3277153
20. C. W. Ou, Dhananjay, Z. Y. Ho, Y. C. Chuang, S. S. Cheng, M. C. Wu, K. C. Ho, and C. W. Chu, Appl. Phys. Lett. APPLAB 0003-6951, 92, 122113 (2008). 10.1063/1.2898217 (Pubitemid 351451647)
21. H. Shimotani, H. Suzuki, K. Ueno, M. Kawasaki, and Y. Iwasa, Appl. Phys. Lett. APPLAB 0003-6951, 92, 242107 (2008). 10.1063/1.2939006
22. K. Matsuzaki, K. Nomura, H. Yanagi, T. Kamiya, M. Hirano, and H. Hosono, Phys. Status Solidi A PSSABA 0031-8965, 206, 2192 (2009). 10.1002/pssa.200881795
23. G. M. Wu, J. Wang, X. F. Tang, M. Gu, L. Y. Chen, and J. Shen, Acta Phys. Sin. WLHPAR 1000-3290, 49, 1015 (2000).
24. J. Isidorsson, C. G. Granqvist, K. von Rottkay, and M. Rubin, Appl. Opt. APOPAI 0003-6935, 37, 7334 (1998). 10.1364/AO.37.007334
25. M. S. Moreno, G. Punte, G. Rigotti, R. C. Mercader, A. D. Weisz, and M. A. Blesa, Solid State Ionics SSIOD3 0167-2738, 144, 81 (2001). 10.1016/S0167-2738(01)00882-7 (Pubitemid 32866999)
26. H. Giefers, F. Porsch, and G. Wortmann, Solid State Ionics SSIOD3 0167-2738, 176, 199 (2005). 10.1016/j.ssi.2004.06.006
27. M. S. Moreno, R. C. Mercader, and A. G. Bibiloni, J. Phys.: Condens. Matter JCOMEL 0953-8984, 4, 351 (1992). 10.1088/0953-8984/4/2/004
28. S. Goldsmith, E. Cetinorgu, and R. L. Boxman, Thin Solid Films THSFAP 0040-6090, 517, 5146 (2009). 10.1016/j.tsf.2009.03.019
29. A. De and S. Ray, J. Phys. D: Appl. Phys. JPAPBE 0022-3727, 24, 719 (1991). 10.1088/0022-3727/24/5/014
30. R. Sivaramasubramaniam, M. R. Muhamad, and S. Radhakrishna, Phys. Status Solidi A PSSABA 0031-8965, 136, 215 (1993). 10.1002/pssa.2211360126
31. L. Y. Liang, Z. M. Liu, H. T. Cao and X. Q. Pan, ACS Appl. Mater. Interfaces, In press. [DOI: 10.1021/am900838z]
32. Q. H. Li, D. L. Zhu, W. J. Liu, Y. Liu, and X. C. Ma, Appl. Surf. Sci. ASUSEE 0169-4332, 254, 2922 (2008). 10.1016/j.apsusc.2007.09.104
33. P. D. Paulson and S. S. Hegedus, J. Appl. Phys. JAPIAU 0021-8979, 96, 5469 (2004). 10.1063/1.1797544
34. Y. C. Liu, J. H. Hsieh, and S. K. Tung, Thin Solid Films THSFAP 0040-6090, 510, 32 (2006). 10.1016/j.tsf.2005.10.089
35. C. H. Shek, J. K. L. Lai, G. M. Lin, Y. F. Zheng, and W. H. Liu, J. Phys. Chem. Solids JPCSAW 0022-3697, 58, 13 (1997). 10.1016/S0022-3697(96)00112-6
36. L. Kaplan, A. Benshalom, R. L. Boxman, S. Goldsmith, U. Rosenberg, and M. Nathan, Thin Solid Films THSFAP 0040-6090, 253, 1 (1994). 10.1016/0040-6090(94) 90284-4
37. H. Y. Fan and S. A. Reid, Chem. Mater. CMATEX 0897-4756, 15, 564 (2003). 10.1021/cm0208509
38. S. S. Pan, Y. X. Zhang, X. M. Teng, G. H. Li, and L. Li, J. Appl. Phys. JAPIAU 0021-8979, 103, 093103 (2008). 10.1063/1.2908197 (Pubitemid 351706884)
39. M. Losurdo, D. Barreca, P. Capezzuto, G. Bruno, and E. Tondello, Surf. Coat. Technol. SCTEEJ 0257-8972, 151-152, 2 (2002). 10.1016/S0257-8972(01)01617- 6 (Pubitemid 34231597)
40. H. L. Lu, G. Scarel, M. Alia, M. Fanciulli, S. J. Ding, and D. W. Zhang, Appl. Phys. Lett. APPLAB 0003-6951, 92, 222907 (2008). 10.1063/1.2938697
41. R. D. Shannon, R. C. Shannon, O. Medenbach, and R. X. Fischer, J. Phys. Chem. Ref. Data JPCRBU 0047-2689, 31, 931 (2002). 10.1063/1.1497384 (Pubitemid 36100664)
42. K. Shportko, S. Kremers, M. Woda, D. Lencer, J. Robertson, and M. Wuttig, Nature Mater. NMAACR 1476-1122, 7, 653 (2008). 10.1038/nmat2226
43. P. B. Littlewood, J. Phys. C JPSOAW 0022-3719, 12, 4459 (1979). 10.1088/0022-3719/12/21/013
44. J. C. Phillips, Rev. Mod. Phys. RMPHAT 0034-6861, 42, 317 (1970). 10.1103/RevModPhys.42.317
45. A. Bussmann-Holder, Phys. Rev. B PRBMDO 0163-1829, 40, 11639 (1989). 10.1103/PhysRevB.40.11639
46. Y. P. Du, J. C. Chen, and J. Feng, Acta Phys.-Chim. Sin, 25, 278 (2009).
47. A. F. Khan, M. Mehmood, A. M. Rana, M. T. Bhatti, and A. Mahmood, Chin. Phys. Lett. CPLEEU 0256-307X, 26, 077803 (2009). 10.1088/0256-307X/26/7/077803
48. N. K. Sahoo, S. Thakur, R. B. Tokas, A. Biswas, and N. M. Kamble, Appl. Surf. Sci. ASUSEE 0169-4332, 253, 3455 (2007). 10.1016/j.apsusc.2006.07.048 (Pubitemid 46123683)
49. Dhananjay, S. S. Cheng, C. Y. Yang, C. W. Ou, Y. C. Chuang, M. C. Wu, and C. W. Chu, J. Phys. D: Appl. Phys. JPAPBE 0022-3727, 41, 092006 (2008). 10.1088/0022-3727/41/9/092006 (Pubitemid 351591052)
50. H. Z. Zhang, H. T. Cao, A. H. Chen, L. Y. Liang, Z. M. Liu, and Q. Wan, Solid-State Electron. SSELA5 0038-1101, 54, 479 (2010). 10.1016/j.sse.2009.12. 025
51. J. F. Wager, D. A. Keszler, and R. E. Presley, Transparent Electronics, 1st ed., Chap., p. 130, Springer Science+Business Media, New York (2008).