Design and sensitivity analysis of Fresnel domain computer generated holograms

International Journal of Nanomanufacturing

Volumn 6, Issue 1-4, 2010, Pages 207-218

  Domínguez Caballero, José A ^a   Takahashi, Satoshi ^a   Barbastathis, George ^a   Lee, Sung Jin ^b  

^a Massachusetts Institute of Technology Cambridge   (United States)

^b SAMSUNG Electronics   (South Korea)

Author keywords

CGH; Computer generated holograms; Electron beam writing; Fresnel domain; Iterative algorithm; Lithography; On axis off axis geometries; Optimisation; Sensitivity analysis

Indexed keywords

ELECTRON BEAMS; ELECTRON HOLOGRAPHY; HOLOGRAMS; ITERATIVE METHODS; LITHOGRAPHY; SENSITIVITY ANALYSIS;

COMPUTER GENERATED HOLOGRAMS; ELECTRON BEAM WRITING; FRESNEL DOMAINS; ITERATIVE ALGORITHM; ON-AXIS; OPTIMISATIONS;

COMPUTER GENERATED HOLOGRAPHY;

EID: 77956016949     PISSN: 17469392     EISSN: 17469406     Source Type: Journal    
DOI: 10.1504/IJNM.2010.034784     Document Type: Article

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