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Journal of Applied Physics

Volumn 108, Issue 3, 2010, Pages

Fabrication and field emission study of atomically sharp high-density tungsten nanotip arrays

(8) Sun, Ke a Lee, Jae Young a Li, Biyun a Liu, Wei a Miao, Congqin a Xie, Ya Hong a Wei, Xinyu b Russell, Thomas P b

a UNIVERSITY OF CALIFORNIA (United States)

b UNIVERSITY OF MASSACHUSETTS (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION PROCESS; FIELD EMISSION PROPERTY; FIELD ENHANCEMENT FACTOR; FULLY COMPATIBLE; HIGH-DENSITY; LOW VACUUM; NANOCASTING; RADIUS OF CURVATURE; SHARP TIP; SI TECHNOLOGY; SUBMICRON; TOP-DOWN PROCESS; TURN-ON FIELD; VACUUM LEVEL;

FABRICATION; FIELD EMISSION; FIELD EMISSION CATHODES; SILICON COMPOUNDS; TUNGSTEN; VACUUM;

NANOTIPS;

EID: 77955910706 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3437079 Document Type: Article

Times cited : (16)

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